Semiconductor memory device and high-voltage switching circuit

ABSTRACT

A semiconductor memory device comprises an array of electrically rewritable memory cells which are arranged in a matrix, erasing section for applying an erasing voltage to the memory cells to effect erasing, and writing section for applying a writing voltage to the memory cells to effect writing, wherein in the erasing section and writing section, either MOS transistors to which a voltage higher than the erasing voltage and writing voltage is applied or MOS transistors which transfer a voltage higher than the erasing voltage and writing voltage contain MOS transistors which are in a weak inversion state or an inversion state with their substrate bias voltage, gate voltage and source voltage at 0 V.

This application is a continuation of application Ser. No. 08/516,360,filed on Aug. 17, 1995, now abandoned.

BACKGROUND OF THE INVENTION

1. Field of the Invention

This invention relates to a semiconductor memory device, such as anelectrically rewritable nonvolatile semiconductor memory device(EEPROM), and more particularly to an EEPROM that writes and erases thedata into and from memory cells by tunnel current.

The invention further relates to such a high-voltage switching circuitas is used in the semiconductor memory device, and more particularly toa voltage switching circuit that uses only NMOS transistors (n-channelMOS transistors).

2. Description of the Related Art

One known type of EEPROMs is a NAND-cell EEPROM capable of highintegration. In this type of EEPROM, a plurality of memory cells areconnected in series in such a manner that their source and drains may beshared by adjacent cells and these series-connected cells are treated asone unit and connected to a bit line. The memory cells generally have anFETMOS structure in which a charge storage layer (a floating gate) and acontrol gate are laminated together. The memory cell array is formed byintegrating cells in a p-type substrate or p-well. The drain side of aNAND cell is connected to a bit line via a select gate and the sourceside is connected to a common source line via a select gate. The controlgates of the memory cells are arranged consecutively in the rowdirection and serve as word lines.

The NAND-cell EEPROM operates as follows. The data is written, startingat the memory cell farthest from the bit line (i.e., the memory cell onthe source line side). A high voltage V_(ppW) (=about 18 V) is appliedto the control gate of the selected memory cell, an intermediate voltageof V_(m10) (=about 10 V) is applied to the control gates of the memorycells closer to the bit line than the selected one and their selectgates on the drain side, and 0 V or an intermediate voltage of V_(m8)(=about 8 V) is applied to the bit line according to the data.

When 0 V is applied to the bit line, the voltage is transferred to thedrain of the selected memory cell, causing electrons to be injected intoa charge storage layer. This causes the threshold voltage of theselected memory cell to shift in the positive direction. This state isassumed to be "0", for example. When V_(m8) is applied to the bit line,electron injection virtually does not take place and consequently thethreshold voltage does not change and remains negative. This state isassumed to be "1" and the erased state. The data is writtensimultaneously into the memory cells sharing the control gate.

The data is erased in blocks simultaneously from all of the memory cellsin the selected NAND cell. All of the control gates in the selected NANDcell block are set at 0 V and the p-well is set at 20 V. At this time,with the high voltage applied to the p-well, the select gate, bit line,and source line are also set at 20 V. This causes the electrons in thecharge storage layer to be discharged into the p-well in all of thememory cells in the selected NAND cell block, causing the thresholdvoltage to shift in the negative direction. All of the control gates ofthe memory cells in the NAND-cell blocks not to be erased are set at 20V. High voltages necessary for writing and erasing are generated at thecharge pump circuit.

The data is read by setting the control gate of the selected memory cellat 0 V and the control gates and select gates of the other memory cellsat a power-supply voltage Vcc (e.g., 3 V), and sensing whether or notcurrent flows through the selected memory cell. To achieve this, thethreshold voltage of the memory cell after writing must be Vcc or less.

Since such a NAND-cell EEPROM uses a wide voltage range of 0 V to Vpp(up to 20 V), transistors dealing with a voltage range of 0 V to V_(m10)(up to 10 V) (hereinafter, abbreviated as Vm-route transistors) andhigh-withstand-voltage transistors handling a voltage range of 0 V toVpp (hereinafter, abbreviated as Vpp-route transistors) are needed. Thereason for this is that a circuit to which only a voltage of V_(m10) orless is applied is composed of Vm-route transistors of a relativelysmall size, thereby suppressing the circuit area and only thetransistors to which Vpp is applied are determined to be Vpp-routetransistors.

This type of device, however, has the following problem.

When n-channel and p-channel MOS transistors are used as Vpp-routetransistors, the number of types of transistor increases and productioncost rises. When, for example, only n-channel MOS transistors are usedas Vpp-route transistors and constitute a circuit, the power-supplyvoltage cannot be made low because of a decrease in the voltage transferefficiency due to the threshold voltage of the transistors. Furthermore,when a circuit is composed of, for example, n-channel MOS transistorswith a low threshold voltage, acting as Vpp-route transistors, leakagecurrent in the transistors increases the drawn current in the stand-bycondition or prevents the high voltage Vpp from being stepped up fromthe power supply voltage.

Still furthermore, since the writing voltage and erasing voltage aregenerated internally at the charge pump circuit, variations inproduction are liable to have an adverse effect on the devices andvariations in the threshold voltage after the data has been written intothe memory cell must be restricted within a specific range.

Additionally, the above-described semiconductor memory device isprovided with a high-voltage switching circuit that switches the highvoltage between the selected mode and the unselected mode. With thehigh-voltage switching circuit, a high voltage is applied to the sourceof an n-channel MOS transistor (hereinafter, referred to as an NMOStransistor) and a gate voltage is applied to its gate, depending onwhether it is in the selected or unselected mode. Specifically, in theselected mode, the gate of the NMOS transistor is applied with thestepped-up voltage, or a high voltage raised from the power supplyvoltage, the output (drain) is supplied with a boosted voltage higherthan the high voltage by at least the threshold voltage of the NMOStransistor so as to achieve complete transfer. In the unselected mode,the gate is applied with the ground.

With the high-voltage switching circuit, although the magnitude of thehigh boosted voltage required depends on the threshold voltage of theNMOS transistor, the boosted voltage must be made as low as possible toimprove the reliability of the transistor. Therefore, the thresholdvoltage of the NMOS transistor must be made as low as possible. Use oftransistors with a low threshold voltage would result in a poorercut-off characteristic, increasing a leakage current from the highvoltage when the high voltage is not transferred. Specifically, evenwhen the output and the gate of the NMOS transistor are grounded, thetransistor is not cut off, permitting the input or a leakage currentfrom the high voltage to increase. In this way, because the high voltageis obtained by stepping up the power-supply voltage, as the leakagecurrent increases, a desired high voltage cannot be output.

SUMMARY OF THE INVENTION

An object of the present invention is to provide a semiconductor memorydevice which, even if only n-channel MOS transistors whose thresholdvoltage is low are used as Vpp-route transistors to constitute acircuit, is capable of reducing the power consumption in the stand-bycondition, sufficiently stepping up a high voltage of Vpp, lowering thepower supply voltage, and reducing the manufacturing cost.

Another object of the present invention is to provide a high-voltageswitching circuit which, even if the threshold voltage of an NMOStransistor drops and its cut-off characteristic deteriorates, reduces aleakage current from the high voltage obtained by stepping up thepower-supply voltage in the unselected mode and thereby prevents thehigh voltage from dropping.

A semiconductor memory device according to the present invention uses,for example, only n-channel MOS transistors whose threshold voltage islow as Vpp-route transistors. Only from the viewpoint of voltagetransfer efficiency, all of the Vpp-route transistors that transfer thehigh voltage for erasing and writing are determined to be, for example,n-channel MOS transistors whose threshold voltage is low. To suppressleakage current, all of the block select circuits are brought into theselected state in the stand-by condition. Furthermore, a switchingcircuit is composed of a voltage transfer circuit made up of twoVpp-route transistors connected in series and sharing the gate electrodeand a bias circuit that is connected to the series connection andactivated so as to apply a bias to suppress a leakage current when thevoltage is not transferred. To reduce the drawn current in the stand-bycondition, the bias circuit is deactivated.

Furthermore, the distribution of the threshold voltage after writing ismeasured and the writing voltage is regulated on the basis of thethreshold voltages with distribution rates larger than a specific value.In addition, the memory cells with the threshold voltages a specificvalue or more away from these threshold voltages are relieved.

Concrete configurations of a semiconductor memory device according tothe present invention are as follows.

A semiconductor memory device comprises: an array of electricallyrewritable memory cells laminated which are arranged in a matrix;erasing means for applying an erasing voltage to the memory cells toeffect erasing; and writing means for applying a writing voltage to thememory cells to effect writing, and is characterized in that, in theerasing means and writing means, one of MOS transistors to which avoltage higher than the erasing voltage and writing voltage is appliedand MOS transistors which transfer a voltage higher than the erasingvoltage and writing voltage contain MOS transistors which are in a weakinversion state or an inversion state with their substrate bias voltage,gate voltage and source voltage at 0 V. Each of the memory cells iscomposed of a charge storage layer and a control gate laminated togetheron a semiconductor layer and composed of a source and a drain at asurface of the semiconductor substrate.

Another semiconductor memory device comprises: an array of electricallyrewritable memory cells laminated which are arranged in a matrix;erasing means for applying an erasing voltage to the memory cells toeffect erasing; and writing means for applying a writing voltage to thememory cells to effect writing, and is characterized in that in theerasing means and writing means, either MOS transistors to which avoltage higher than the erasing voltage and writing voltage is appliedor MOS transistors which transfer a voltage higher than the erasingvoltage and writing voltage contain MOS transistors composed only of MOStransistors of a first type, the MOS transistors being in a weakinversion state or an inversion state with their substrate bias voltage,gate voltage and source voltage at 0 V. With this configuration, the MOStransistors are n-channel MOS transistors and has the followingpreferred features.

(1) A voltage to be transferred is applied to the source under aconditions that the substrate bias voltage is at 0 V and gate voltageand drain voltage are at power-supply voltage, and are in a cut-offstate under a condition the substrate bias voltage and gate voltage areat 0 V.

(2) The MOS transistors are in an inversion state under the conditionsthat the substrate bias voltage is at 0 V and the source voltage is theerasing voltage and writing voltage and that the gate voltage is theerasing voltage and the writing voltage added with the power-supplyvoltage.

(3) The MOS transistors are n-channel MOS transistors and are in acut-off state under the condition at a voltage transferred to the sourcewith the substrate bias voltage at 0V and the gate and drain voltages atthe power supply voltage is applied to the drain with the substrate biasvoltage, source voltage and gate voltage at 0 V.

A still another semiconductor memory device comprises: an array ofelectrically rewritable memory cells laminated which are arranged in amatrix; erasing means for applying an erasing voltage to the memorycells to effect erasing; and writing means for applying a writingvoltage to the memory cells to effect writing, and in characterized inthat in the erasing means and writing means, either MOS transistors towhich a voltage higher than the erasing voltage and writing voltage isapplied or MOS transistors which transfer a voltage higher than theerasing voltage and writing voltage are composed of two types of MOStransistors, a first type and a second type, the second-type MOStransistors being n-channel MOS transistors that are in an inversionstate with the substrate bias voltage at 0 V and the gate and sourcevoltages at a power-supply voltage and in a cut-off state with thesubstrate bias voltage and gate voltage at 0 V and the source voltage atthe power-supply voltage, and the first-type MOS transistors beingn-channel MOS transistors that are in a weak inversion state or aninversion state with the substrate bias voltage, gate voltage, andsource voltage at 0 V and have a threshold voltage higher than that ofthe second-type n-channel MOS transistors. With this configuration, thefirst-type n-channel MOS transistors are n-channel MOS transistors and avoltage to be transferred is applied to the source under a conditionsthat the substrate bias voltage is at 0 V and gate voltage and drainvoltage are at power-supply voltage, and are in a cut-off state under acondition the substrate bias voltage and gate voltage are at 0 V.Further more, the first-type n-channel MOS transistors are in aninversion state under the conditions that the substrate bias voltage isat 0 V and the source voltage is the erasing voltage and writing voltageand that the gate voltage is the erasing voltage and the writing voltageadded with the power-supply voltage. The first-type n-channel MOStransistors are in a cut-off state under the conditions that a voltagetransferred to the source with the substrate bias voltage at 0 V and thegate and drain voltages at the power-supply voltage is applied to thedrain with the substrate bias voltage, source voltage and gate voltageat 0 V, and are in an inversion state under the conditions that thesubstrate bias voltage is at 0 V and the source voltage is the erasingvoltage and writing voltage and that the gate voltage is the erasingvoltage and the writing voltage added with the power-supply voltage.

Another semiconductor memory device is characterized by comprising: amemory cell array where memory cells are arranged in a matrix, thememory cells forming a plurality of memory cell groups; block selectcircuits for selecting memory cell blocks containing the plurality ofmemory cell groups; and means for bringing all of the block selectcircuits into a block-selected state in a stand-by condition. A stillanother semiconductor memory device comprises: an array of electricallyrewritable memory cells laminated which are arranged in a matrix, thememory cells forming a plurality of memory cell groups; erasing meansfor applying an erasing voltage to the memory cells to effect erasing;writing means for applying a writing voltage to the memory cells toeffect writing; and block select circuits for selecting memory cellblocks containing the plurality of memory cell groups, wherein in theerasing means and writing means, MOS transistors to which a voltagehigher than the erasing voltage and writing voltage is applied ortransferred are in a weak inversion state or an inversion state withtheir substrate bias voltage, gate voltage and source voltage at 0 V,and the erasing means and writing means contain means for bringing allof the block select circuits into a block-selected state in a stand-bycondition.

With above configurations, the block select circuits contains voltageconversion circuits, each composed of a block address decoder and a MOStransistor of a first-conductivity type connected to the block addressdecoder and further comprises a block control circuit that receives theoutputs of the block select circuits and controls the memory-cellblocks, in which the block control circuit is a voltage transfer circuitcomposed of the first-conductivity-type MOS transistor whose gateelectrode is connected to the block select circuit.

A semiconductor memory device is characterized by comprising: an arrayof electrically rewritable memory cells laminated which are arranged ina matrix; data storage circuit for temporarily storing the writing data;erasing means for erasing the data in the memory cells; and test meansfor performing an erasure operation without selecting any memory celland at the same time, deactivating the data storage circuit.

Another semiconductor memory device comprises: a memory cell array inwhich memory cells are arranged in a matrix; and memory-cell controlmeans for controlling the memory cells, and is characterized in that thememory cell control means contains a switching circuit comprising acharge transfer circuit where the source electrode of a first MOStransistor is connected to the drain electrode of a second MOStransistor and the gate electrode of the first MOS transistor isconnected to the gate electrode of the second MOS transistor and a biascircuit that applies a bias voltage to the source electrode of thesecond MOS transistor and the drain electrode of the second MOStransistor so as to electrically disconnect the drain electrode of thefirst MOS transistor from the source of the second MOS transistor incase that the switching circuit is unselected and that does not applythe bias voltage to the source electrode of the first MOS transistor andthe drain electrode of the second MOS transistor so as to electricallyconnect the drain electrode of the first MOS transistor to the sourceelectrode of the second MOS transistor in case that the switchingcircuit is selected, the bias circuit being deactivated in a stand-bycondition.

A still another semiconductor memory device comprises: an array ofelectrically rewritable memory cells laminated which are arranged in amatrix; erasing means for erasing the data in the memory cells; writingmeans for writing the data into the memory cells; writing voltageregulating means for regulating a writing voltage; and threshold-voltagesensing means for measuring the threshold voltages of the memory cells,and is characterized in that the data in more than a specific number ofmemory cells is erased and then writing is effected into the erasedmemory cells, the threshold voltages of the memory cells into which thewriting has been done are sensed and the threshold voltage distributionis measured, and the writing voltage is regulated on the basis of thethreshold voltages with distribution rates larger than a specific value.

Another semiconductor memory device comprises: an array of electricallyrewritable memory cells laminated which are arranged in a matrix;erasing means for erasing the data in the memory cells; erasing voltageregulating means for regulating an erasing voltage; writing means forwriting the data into the memory cells; and threshold voltage sensingmeans for measuring the threshold voltages of the memory cells, and ischaracterized in that writing is effected into more than a specificnumber of memory cells and then the erasing of the written memory cellsis effected, the threshold voltages of the memory cells from which thedata has been erased are sensed and the threshold voltage distributionis measured, and the erasing voltage is regulated on the basis of thethreshold voltages with distribution rates larger than a specific value.

A still another semiconductor memory device comprises: an array ofelectrically rewritable memory cells laminated which are arranged in amatrix; erasing means for erasing the data in the memory cells; writingmeans for writing the data into the memory cells; threshold voltagesensing means for measuring the threshold voltages of the memory cells;and redundant memory cells for replacing defective memory cells, and ischaracterized in that the data in more than a specific number of memorycells is erased and then writing is effected into the erased memorycells, the threshold voltages of the memory cells into which the writinghas been done are sensed and the threshold voltage distribution ismeasured, and the memory cells with the threshold voltages more than aspecific value away from the threshold voltages with distribution rateslarger than a specific value are replaced by redundant memory cells.

Another semiconductor memory device comprises: an array of electricallyrewritable memory cells laminated which are arranged in a matrix;erasing means for erasing the data in the memory cells; writing meansfor writing the data into the memory cells; threshold voltage sensingmeans for measuring the threshold voltages of the memory cells; andredundant memory cells for replacing defective memory cells, and ischaracterized in that writing is effected into more than a specificnumber of memory cells and then the erasing of the written memory cellsis effected, the threshold voltages of the erased memory cells aresensed and the threshold voltage distribution is measured, and thememory cells with the threshold voltages more than a specific value awayfrom the threshold voltages with distribution rates larger than aspecific value are replaced by redundant memory cells.

A high-voltage switching circuit for outputting a high voltage appliedto an input terminal to an output terminal in the selected mode andelectrically disconnecting the input terminal from the output terminalin the unselected mode, the high-voltage switching circuit is comprises:a first NMOS transistor having a gate, a source, and a drain coupled tothe input terminal; a second NMOS transistor having a gate, a sourcecoupled to the output terminal, and a drain coupled to the source of thefirst NMOS transistor; and a third NMOS transistor having a gate, asource coupled to the source of the first NMOS transistor, and a drainto which a power-supply voltage is applied, and is characterized in thatthe gates of the first and second NMOS transistors are coupled to an ONvoltage to transfer the high voltage applied via the input terminal tothe drain of the first NMOS transistor to the source of the second NMOStransistor in the selected mode, and are grounded in the unselectedmode, and the gate of the third NMOS transistor is grounded in theselected mode and is coupled to the power-supply voltage in theunselected mode. The circuit is characterized by further comprising abooster which is coupled to the gates of the first and second NMOStransistors and which is deactivated in the unselected mode andactivated in the selected mode, and the first and second NMOStransistors turn off when the booster is deactivated, and a high voltageapplied to the drain of the first NMOS transistor is disconnected fromthe source of the second NMOS transistor, whereas they are turned on bya boosted voltage outputted from the booster when the booster isactivated, and a high voltage applied to the drain of the first NMOStransistor is transferred to the source of the second NMOS transistor.

In addition to the above embodiments, other preferable embodiments are:

(1) n-channel MOS transistor are formed on a first semiconductor layerwhich is grounded.

(2) n-channel MOS transistors of a first type and a second type areformed on a first semiconductor layer which is grounded.

(3) A block control circuit controls the word lines of memory cells.

(4) n-channel MOS transistors of a first type are in a weak inversionstate with the substrate bias voltage, gate voltage, and source voltageat 0 V.

(5) n-channel MOS transistors of a first type are in a very weakinversion state or in a cut-off state with the substrate bias voltage at0 V and the gate and source voltages at a power-supply voltage.

With the present invention, although, for example, only n-channel MOStransistors with a low threshold voltage are used as Vpp-routetransistors, reducing leakage current makes it possible to realizeNAND-cell EEPROMs which can be manufactured at low cost, have a lowpower consumption, and operate efficiently even on a low power-supplyvoltage.

With a semiconductor memory device of the present invention,high-withstand-voltage transistors to which a writing voltage or anerasing voltage is applied can be made up only of such transistors asare in an inverted or a weak inversion state when the threshold voltageis low and the gate voltage, source voltage, and substrate voltage areat 0 V. Furthermore, the high-withstand-voltage transistor may belimited to only one type. A leakage current liable to develop in thestand-by condition because of the low threshold voltage can besuppressed by bringing all of the block select circuits into theblock-selected state in the stand-by condition. In a switching circuitprovided with a bias circuit that biases the point where two suchhigh-withstand-voltage transistors are connected in series, a leakagecurrent can be suppressed by deactivating the bias circuit in thestand-by condition. This enables operation even on the low power-supplyvoltage, realizing the low-cost manufacturing of semiconductor memorydevices.

Furthermore, with a semiconductor memory device according to the presentinvention, a stress test can be conducted at high speeds by deactivatingthe data storage circuit that temporarily stores the writing data in aperipheral circuit voltage stress test during an erase operation. Thisenables greater throughput in the test processing, realizing thelow-cost manufacturing of semiconductor memory devices.

In the unselected mode, the source voltage of the third NMOS transistorgoes to a voltage lower than the power-supply voltage by the thresholdvoltage of the NMOS transistor. Therefore, the cut-off characteristic ofthe first NMOS transistor improves, and a leakage current from the highvoltage is reduced. Since a leakage current from the second NMOStransistor comes from the power-supply voltage applied to thepower-supply terminal, the high voltage will not drop.

In the selected mode, the gate voltage applied to the first and secondNMOS transistors rises to the boosted voltage level of a high voltage,and the gate voltage applied to the gate of the third NMOS transistordrops to the ground. At this time, since the source of the third NMOStransistor is connected to the power-supply voltage, its gate isgrounded, and its drain is at a high voltage, the third NMOS transistorturns off, preventing a leakage current from the high voltage.Therefore, the high voltage applied to the input terminal is supplied,without lowering in level, as an output voltage to the output terminalvia the drain-source of the first and second NMOS transistors.

With the present invention, even when the threshold voltage of the NMOStransistor drops and the cut-off characteristic deteriorates, thestepped-up voltage can be prevented from dropping by reducing a leakagecurrent from the stepped-up voltage in the unselected mode of thehigh-voltage switching circuit.

Additional objects and advantages of the present invention will be setforth in the description which follows, and in part will be obvious fromthe description, or may be learned by practice of the present invention.The objects and advantages of the present invention may be realized andobtained by means of the instrumentalities and combinations particularlypointed out in the appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings, which are incorporated in and constitute apart of the specification, illustrate presently preferred embodiments ofthe present invention and, together with the general description givenabove and the detailed description of the preferred embodiments givenbelow, serve to explain the principles of the present invention inwhich:

FIG. 1 is a block diagram of a NAND-cell EEPROM according to anembodiment of the present invention;

FIGS. 2A to 2C are characteristic diagrams of a high-withstand-voltageMOS transistor;

FIGS. 3A to 3E show the structures of a high-voltage switching circuit;

FIG. 4 shows the structure of a NAND memory-cell array;

FIG. 5 shows the structure of a block select circuit and a block controlcircuit;

FIG. 6 shows the structure of a main bit-line control circuit, a subbit-line control circuit, and a data latch/sense amplifier circuit;

FIG. 7 is a timing chart to help explain a read operation;

FIG. 8 is a timing chart to help explain a read operation;

FIG. 9 is a timing chart to help explain a write operation;

FIG. 10 is a timing chart to help explain a write operation;

FIG. 11 is a timing chart to help explain the operation of conducting astress test on the write peripheral circuit;

FIG. 12 is a timing chart to help explain an erase operation;

FIG. 13 is a timing chart to help explain the operation of conducting astress test on the erase peripheral circuit;

FIGS. 14A and 14B show concrete structures of the control circuit;

FIG. 15 is a timing chart to help explain the operation of the controlcircuit;

FIGS. 16A and 16B show concrete structures of the control circuit;

FIG. 17 is a timing chart to help explain the operation of the controlcircuit;

FIGS. 18A and 18B show concrete structures of the control circuit;

FIG. 19 is a timing chart to help explain the operation of the controlcircuit;

FIGS. 20A to 20C show concrete structures of the control circuit;

FIG. 21 is a timing chart to help explain the operation of the controlcircuit;

FIG. 22 shows a concrete structure of the control circuit;

FIG. 23 is a timing chart to help explain the operation of the controlcircuit;

FIG. 24 shows a concrete structure of the control circuit;

FIG. 25 is timing chart to help explain the operation of the controlcircuit;

FIG. 26 shows a concrete structure of the control circuit;

FIG. 27 shows a concrete structure of the control circuit;

FIG. 28 shows a concrete structure of the control circuit;

FIG. 29 is a timing chart to help explain the operation of the controlcircuit;

FIG. 30 shows a concrete structure of the control circuit;

FIG. 31 shows a concrete structure of the control circuit;

FIG. 32 shows a concrete structure of the control circuit;

FIG. 33 is a timing chart to help explain the operation of the controlcircuit;

FIG. 34 shows a concrete structure of the control circuit;

FIG. 35 is a timing chart to help explain the operation of the controlcircuit;

FIG. 36 shows a concrete structure of the control circuit;

FIG. 37 is a timing chart to help explain the operation of the controlcircuit;

FIG. 38 shows a concrete structure of the control circuit;

FIG. 39 is a timing chart to help explain the operation of the controlcircuit;

FIG. 40 shows a concrete structure of the control circuit;

FIG. 41 is a timing chart to help explain the operation of the controlcircuit;

FIG. 42 shows a concrete structure of the control circuit;

FIG. 43 is a timing chart to help explain the operation of the controlcircuit;

FIG. 44 shows a concrete structure of the control circuit;

FIG. 45 is a timing chart to help explain the operation of the controlcircuit;

FIG. 46 shows a concrete structure of the control circuit;

FIG. 47 is a timing chart to help explain the operation of the controlcircuit;

FIG. 48 shows a concrete structure of the control circuit;

FIG. 49 is a timing chart to help explain the operation of the controlcircuit;

FIG. 50 shows a concrete structure of the control circuit;

FIG. 51 is a timing chart to help explain the operation of the controlcircuit;

FIGS. 52A and 52B show concrete structures of the control circuit;

FIG. 53 shows a concrete structure of the control circuit;

FIG. 54 shows a concrete structure of the control circuit;

FIG. 55 is a timing chart to help explain the operation of the controlcircuit;

FIG. 56 is a timing chart to help explain the operation of the controlcircuit;

FIG. 57 shows a concrete structure of the control circuit;

FIG. 58 shows the distribution of threshold voltages after the data hasbeen written into memory cells;

FIGS. 59A and 59B show an algorithm for a method of trimming the writingvoltage and sensing discrete bits;

FIG. 60 is an another block diagram of a NAND-cell EEPROM according toan embodiment of the present invention;

FIG. 61 a still another block diagram of a NAND-cell EEPROM according toan embodiment of the present invention; and

FIG. 62 shows a still another block diagram of a NAND-cell EEPROMaccording to an embodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Hereinafter, referring to the accompanying drawings, embodiments of thepresent invention will be explained.

FIG. 1 shows the structure of a NAND-cell EEPROM according to anembodiment of the present invention. Bisected memory cell arrays 1A, 1Bare provided with main bit-line control circuits 2A, 2B and sub bit-linecontrol circuits 3A, 3B, respectively. A memory cell array 1 is providedwith a data latch/sense amplifier circuit 4 that functions as a senseamplifier in a read operation and as a writing data latch circuit in awrite operation. The main and sub bit-line control circuits 2A, 2B, 3A,3B, and data latch/sense amplifier circuit 4 are controlled by a columncontrol circuit 5.

Block select circuits 7A, 7B that receive the output of a block addressbuffer 8 and select blocks and word-line control circuits 6A, 6B thatcontrol the word lines of the selected blocks are provided in the memorycell arrays 1A, 1B, respectively. The block select circuits 7A, 7B andword-line control circuits 6A, 6B are controlled by a row controlcircuit 9.

To control a cell well in which the memory cell array 1 is formed andthe source lines of the memory cells, a cell-well control circuit 10 anda cell-source control circuit 11 are provided.

The voltages Vpp (up to 20 V), V_(m10) (up to 10 V), and V_(m8) (up to 8V) necessary for writing and erasing are stepped up from a power supplyvoltage of Vcc (e.g., 3 V) at a Vpp charge pump circuit 12, a V_(m10)charge pump circuit 13, and a V_(m8) charge pump circuit 14,respectively.

FIG. 2A shows a high-withstand-voltage n-channel MOS transistor(hereinafter, referred to as an HVNMOS transistor) Qh used in thepresent embodiment and applied with the voltage Vpp. FIGS. 2B and 2Cshow static characteristics of the transistor. In the characteristicdiagrams, the drain current Id is shown with the gate voltage Vg as aparameter in the case where the source and substrate are grounded asshown in FIG. 2A and a voltage is applied to the drain so that thetransistor may operate like a pentode. A threshold voltage of Vt isdefined as shown in FIG. 2B. The threshold voltage Qh of the HVNMOStransistor is lower than that of an enhanced type transistor and is notcut off even if the gate voltage Vg is 0 V as shown in FIG. 2C, i.e., isin a weak inversion state. The threshold voltage Vt may be negative. Itis desirable, however, that the threshold voltage Vt should be positiveand in the weak inversion state with the gate voltage Vg being 0 V.

The substrate bias voltage may be applied as required according to theoperation. It is desirable, however, that the substrate should begrounded.

FIG. 3A shows a high-voltage switching circuit (hereinafter, referred toas a switching circuit) composed of HVNMOS transistors Qh. A first andsecond HVNMOS transistors Qh1 and Qh2 are connected together at node N1and both have a gate voltage of V1. A bias circuit 15 is connected tonode N1. Hereinafter, the substrate bias in an n-channel MOS transistoris at 0 V unless otherwise specified.

When the drain voltage Vin of HVNMOS transistor Qh1 is transferred tothe source voltage Vout of HVNMOS transistor Qh2, voltage V1 is sethigher than Vin+Vt (sub=Vin). Vt (sub=Vsub) is the threshold voltage ofHVNMOS transistor at the time when the substrate bias is -Vsub. At thistime, the bias circuit 15 is in the deactivated state so as to have noeffect on node N1.

When voltage Vin is electrically cut off from voltage Vout, V1 is set ata sufficiently low voltage (e.g., 0 V) and the activated bias circuit 15applies a sufficiently high specific voltage to node N1. With thesufficiently high voltage Vin or Vout, HVNMOS transistor Qh1 or Qh2 isin the cut-off state, electrically cutting off voltage Vin from Vout.Furthermore, when the switching circuit is in the stand-by condition,the bias circuit 15 is also in the deactivated state.

A more concrete circuit diagram of the switching circuit is given inFIG. 3B and a concrete operation of the embodiment will be explained.

The switching circuit is provided in, for example, the power-supplycircuit of the semiconductor memory device and applies to thesemiconductor memory circuit the high voltage Vin obtained by steppingup a power-supply voltage Vcc. The switching circuit is made up of afirst to third HVNMOS transistors Qh1 to Qh3. The drain of the firstNMOS transistor Qh1 is connected to input terminal Tin to which highvoltage Vin is applied and its source is connected to the drain of thesecond HVNMOS transistor Qh2. The source of the second NMOS transistorQh2 is connected to output terminal Tout that supplies output voltageVout. The gates of the first and second HVNMOS transistors Qh1, Qh2 areconnected to the gate voltage.

The connection, or node, between the first NMOS transistor Qh1 and thedrain of the second NMOS transistor Qh2 is connected to the source ofthe third HVNMOS transistor Qh3. The drain of the third HVNMOStransistor Qh3 is connected to input terminal Tbias and its gate isselectively connected to the signal of the power-supply voltage and theground.

In the above circuit, the power supply Vbias for the bias circuit has,for example, a power-supply voltage of Vcc (up to 3 V). Voltage Vin isthe stepped-up voltage Vpp (up to 20 V). When this voltage istransferred to Vout, voltage V1 is set at Vpp+Vt (sub=Vpp) or more. Thecontrol voltage V2 of the bias circuit is set at 0 V, for example. Whenthe source and drain are at Vcc, the substrate bias and the gate is at 0V, and the HVNMOS transistor Qh is in the cut-off state, voltage Vin istransferred to Vout only.

Even when the control voltage V2 of the bias circuit is, for example,Vcc, there is no problem as long as no charge is transferred from nodeN1 to Vbias by the back bias effect.

When voltage Vin is the stepped-up voltage Vpp (up to 20 V) andelectrically cut off Vout, voltage V1 is set at 0 V, for example.Furthermore, voltage V2 is Vcc, for example. When the voltage at node N1transferred by HVNMOS transistor Qh3 is Vn1, the source and drain are atVn1, and the substrate bias and gate are at 0 V, and the HVNMOStransistor Qh is in the cut-off state, this brings HVNMOS transistor Qh1into the cut-off state, electrically cutting off voltage Vpp inputted toVin from Vout.

For example, when the NAND-cell EEPROM of the present embodiment is inthe stand-by condition (all of the circuits are in the stand-bycondition), the switching circuit of FIG. 3B is also in the stand-bycondition with voltage V1, for example, at 0 V. With voltage Vout at 0V, when voltage V2 is, for example, at Vcc, Vcc serving as voltage Vbiasleaks to Vout. As a result, when the switching circuit is in thestand-by condition, voltage V2 is set at, for example, 0 V, deactivatingthe bias circuit 15. This reduces the leakage current from Vbias to Voutremarkably. In the stand-by condition, Vin is often at about Vcc, sothat there is a leakage current from Vin to Vout. The leakage current,however, is much smaller than the leakage current from Vbias to Vout inthe case where voltage V2 is, for example, at Vcc.

The operation will be explained in more detail about the selected modeand the unselected mode.

In the unselected mode, gate voltage V1 applied to the gates of thefirst and second NMOS transistors Qh1 and Qh2 is at the ground, and gatevoltage V2 applied to the gate of the third HVNMOS transistor Qh3 is atthe power-supply voltage level. At this time, the source voltage of thethird HVNMOS transistor Qh3 is lower than the power-supply voltage Vccby the threshold voltage of HVNMOS transistor Qh1. As a result, thecut-off characteristic of HVNMOS transistor Qh3 improves, reducing theleakage current from the stepped-up voltage Vin. In contrast, becausethe source (Vout) of the second HVNMOS transistor Qh2 and its gate areat the ground, a leakage current as large as in a conventionalequivalent develops. The leakage current, however, stems from thepower-supply voltage Vcc applied to terminal Tbias, so that thestepped-up voltage Vin will not drop.

In the selected mode, gate voltage V1 applied to the gates of the firstand second HVNMOS transistors Qh1 and Qh2 is at the boosted voltagelevel of high voltage Vin, and gate voltage V2 applied to the gate ofthe third HVNMOS transistor Qh3 is at the ground. At this time, sincethe source of the third HVNMOS transistor Qh3 is connected to the powersupply voltage Vcc, its gate is grounded, and its drain is at thestepped-up voltage Vin, the third HVNMOS transistor Qh3 is off,preventing a leakage current from the stepped-up voltage Vin. Therefore,the high voltage Vin applied to input terminal Tin is supplied, withoutits level being dropped, as output voltage Vout to output terminal Toutvia the drains and sources of the first and second HVNMOS transistorsQh1 and Qh2.

Another structure of the switching circuit is shown in FIG. 3C.

In this switching circuit, a switching main section 15 has a similarstructure to that of the embodiment of FIG. 3B and is composed of thefirst, second, and third HVNMOS transistors Qh1, Qh2, and Qh3. A booster22 is connected between the switching main section 15 and control input(Vin0) terminal Tin0, which constitutes a switching circuit.

With the switching circuit, in the unselected mode, Vin terminal Tin0 isat a high level, the booster 22 is deactivated, and the output terminalof the booster 22 is grounded. As a result, the HVNMOS transistors Qh1and Qh2 are off, electrically disconnecting the high voltage Vin fromthe output Vout.

In the selected mode, Vin terminal Tin0 is at a low level. At this time,the booster 22 is activated, outputting a boosted voltage of the highvoltage Vin. The boosted voltage causes the HVNMOS transistors Qh1 andQh2 to turn on, which enables the high voltage Vin applied to the drainof the HVNMOS transistor Qh1 to be transferred to the source of theHVNMOS transistor Qh2 and then outputted at the output (Vout) terminal15. Thereafter, to cut off the HVNMOS transistors Qh1 and Qh2, Vinterminal Tin0 is placed at the high level. At this time, the booster 22is reset and the output terminal is grounded.

With the above-described switching circuit, in the unselected mode, thecontrol input Vin is at a high level, the source voltage of the NMOStransistor Qh1 is lower than the power-supply voltage Vcc by thethreshold voltage of the HVNMOS transistor Qh3. As a result, the cut-offcharacteristic of HVNMOS transistor Qh1 is improved, reducing a leakagecurrent from the stepped-up voltage Vin. Because the source (Vout) andgate of the HVNMOS transistor Qh2 are grounded, a leakage current aslarge as in a conventional equivalent develops as shown in FIG. 3B. Theleakage current comes from the power-supply voltage Vcc, so that theproblem that the stepped-up voltage Vin drops will not arise.

On the other hand, in the selected mode, the control input Vin is at alow level, so that the source of the HVNMOS transistor Qh3 is at thepower-supply voltage level, the gate is at the ground, and the drain isat the stepped-up voltage Vin. Therefore, the HVNMOS transistor Qh3 isoff, preventing a leakage current from the stepped-up voltage Vin.Consequently, the high voltage Vin applied to input terminal Tin issupplied, without its level being dropped, as output voltage Vout tooutput terminal Tout via the drains and sources of the first and secondHVNMOS transistors Qh1 and Qh2.

Still another structure of the switching circuit is shown in FIG. 3D.

The booster 22 of FIG. 3C is composed of a NOR gate 30, HVNMOStransistors Qh1A to Qh4C, and an inverter 41. A first input terminal ofNOR gate 30 is connected to Vin terminal Tin0 and a second inputterminal of NOR gate 30 is connected to a clock (.o slashed.) terminal.The gate of HVNMOS transistor Qh3B is connected to Vin terminal Tin0,its drain is connected to a Vcc terminal, and its source is connected tothe source-drain connection node between HVNMOS transistors Qh1B andQh2B. The source of HVNMOS transistor Qh2B is connected to not only thedrain and source of a HVNMOS transistor Qh2C but also the drain of anHVNMOS transistor Qh3C. The gate of HVNMOS transistor Qh3C is connectedto not only the gate of an HVNMOS transistor Qh4C but also the Vccterminal. The drain of HVNMOS transistor Qh4C is connected to not onlythe source of HVNMOS transistor Qh2C but also the gates of the HVNMOStransistors Qh1B, Qh2B, Qh1A, and Qh2A. The source-drain connection nodebetween the HVNMOS transistors Qh1A and Qh2A is connected to the sourceof an HVNMOS transistor Qh3A. The source of HVNMOS transistor Qh2A isconnected to its own gate. The source and drain of HVNMOS transistorQh1C are connected together and to the output terminal of a NOR gate 30and its gate is connected to the gate-drain connection node of HVNMOStransistor Qh2C. An inverter 41 is connected between Vin terminal andthe source of HVNMOS transistor Qh3C. The high voltage Vin is applied tothe drains of the HVNMOS transistors Qh1B and Qh1A.

The output of the booster 22 thus constructed, or the source of HVNMOStransistor Qh2A, is connected to the gates of the HVNMOS transistors Qh1and Qh2 in the main switching section 15.

In the embodiment of FIG. 3D, the booster 22 is provided with twoswitching circuits of FIG. 3B. Namely, the booster 22 is provided with acircuit composed of the HVNMOS transistors Qh3B, Qh1B, Qh2B and acircuit composed of the HVNMOS transistors Qh1A, Qh2A, Qh3A.

With the above circuit, in the unselected mode, input Vin is at a highlevel. At this time, the gates of the HVNMOS transistors Qh1B, Qh2B,Qh2C, Qh1A, Qh2A, Qh1C are grounded. Since the source voltage of theHVNMOS transistors Qh1B, Qh1A, and 11 are lower than the power-supplyvoltage Vcc by the threshold voltage of the NMOS transistor, a leakagecurrent from the stepped-up voltage Vin will not develop. Therefore, thestepped-up voltage will not drop.

In the selected mode, input Vin is at a low level. At this time, thevoltage VPMP at the drain-gate connection node of HVNMOS transistorQh2C, the source-gate connection node of HVNMOS transistor Qh2A, and thevoltage V1 at the common connection node between the gates of HVNMOStransistors Qh1B, Qh2B, Qh1A and the source of HVNMOS transistor Qh2Care lower than the power-supply voltage Vcc by the threshold voltage ofthe NMOS transistor because of the presence of an inverter 41. An HVNMOStransistor Qh1C whose source and drain are connected together and whichfunctions as a capacitor is driven by clock .o slashed. via the NOR gate30. While the HVNMOS transistors Qh1B, Qh2B are operating in the pentoderegion, the HVNMOS transistor Qh1C is charged by the stepped-up voltageVin to VPMP expressed by the following equation (1) during the time whenclock .o slashed. is at a high level:

    VPMP=V1-vt                                                 (1)

The charge stored in the NMOS FIG. 40 when clock .o slashed. is at a lowlevel is transferred to the source of the HVNMOS transistor Qh2C, withthe result that voltage V1 increases by value Δ V1 expressed by thefollowing equation (2):

    ΔV1=(VPMP+Vcc-Vt)-V1=Vcc-2Vt                         (2)

where Vt is assumed to meet the following expression (3):

    vt<Vcc/2                                                   (3)

In this way, during one cycle of clock .o slashed., voltage V1 increasesby ΔV1 expressed by equation (2). This continues until voltage V1becomes Vin+Vt. When voltage V1 has reached this value, the HVNMOStransistors Qh1A, Qh2A turn on, preventing these transistors from beingboosted to a higher voltage unnecessarily. The value is equal to thenecessary minimum to raise the output Vout to the stepped-up voltageVin.

FIG. 3E shows still another structure of the switching circuit. Anenhanced type p-channel MOS transistor (hereinafter, referred to as aPMOS transistor) Qp1 is connected in series between an HVNMOS transistorQh3 and the voltage Vbias. The PMOS transistor, together with the HVNMOStransistor Qh3, constitutes a bias circuit 15. The PMOS transistor hasno high-voltage withstand structure. Its gate voltage is V3. In thestand-by condition, voltage V3 is set at, for example Vcc, cutting off aleakage current from the voltage Vbias to Vout. In the non-stand-bycondition (in the activated condition), V3 is set at, for example, 0 V.With the switching circuit, in the stand-by condition, voltage V2 maybe, for example, Vcc. The PMOS transistor Qp1 is basically shared by aplurality of bias circuits 15 of FIG. 3B.

Since the switching circuits shown in FIGS. 3A to 3E are composed ofHVNMOS transistors Qh whose threshold voltage is low, they have theadvantages of suppressing the voltage V1 to a low level and lowering thegate insulating film breakdown voltage, when the high voltage Vppapplied to voltage Vin is transferred.

FIG. 4 shows a concrete structure of the memory cell array 1. Memorycells M1 to M16 are connected in series. One end of the seriesconnection is connected to a bit line BL via a depletion type selecttransistor S1 and an enhanced type select transistor S2, and the otherend is connected to a common source line Vsource via a depletion typeselect transistor S3 and an enhanced type select transistor S4, therebyforming a NAND-cell unit NCU1.

The gate electrodes of the memory cells M1 to M16 are connected to thecontrol gates CG1 to CG16, respectively, and are shared by a pluralityof NAND-cell units. The NAND cell unit NCU2 adjacent to the NAND cellunit NCU1 sharing the control gate differs in the type of selecttransistor S1. This holds true for the select transistors S2 to S4.Specifically, in the case of the select transistors S1 sharing oneselect gate, for example, SGD1, depletion type ones and enhanced typeones are arranged alternately.

In the alternately arranged NAND-cell units NCU1 and NCU2, a pair ofadjacent units shares a bit line BL. The NAND cell units sharing controlgates CG1 to CG16 and select gates SGD1, SGD2, SGS1, and SGS2 constituteone block. A memory cell M and select transistor S are of the n-channeltype. The memory cell array 1 is formed on a dedicated p-well C-p-well.

FIG. 5 concretely shows the word-line control circuit 6 and block selectcircuit 7 of FIG. 1 together with the memory cell array of FIG. 4.

HVNMOS transistors Qh20 to Qh24 and enhanced type n-channel MOStransistors (hereinafter, referred to as NMOS transistors) Qn4constitute a select gate control circuit that controls a select gate,for example, SGD1. The NMOS transistor Qn has no high-voltage withstandstructure. The circuit made up of the HVNMOS transistors Qh21 to Qh23has the same configuration as that of the switching circuit composed ofthe HVNMOS transistors Qh1 to Qh3 shown in FIG. 3C to 3E. The HVNMOStransistor Qh25 constitutes a control gate control circuit that controlsa control gate, for example, CG1. Four select gate control circuits and16 control gate control circuits constitute a word-line control circuit6 that controls the word lines for a single cell block.

Each word-line control circuit 6, using the output N2 of the blockselect circuit 7 as a block select signal, selectively transfers andapplies the voltages VSGD1, VSGD2, VSGS1, VSGS2 common to each block andthe voltages VCG1 to VCG16 to the control gates SGD1, SGD2, SGS1, SGS2of the selected block and the control gates CG1 to CG16.

The block select circuit 7 is composed largely of two circuits. Onecircuit of the block select circuit 7 is a block address decoder made upof PMOS transistors Qp2 to Qp5, NMOS transistors Qnl to Qn3, a fuse F1,inverters I1, I2, and NOR gates G1, G2. In a case where the fuse F1 iscut off or any one of block address signals RA, RB, RC is low, when adecoder activating inverted signal RDENBB is low, the output N3 of theblock address decoder is low and in the block unselected state. At thistime, a sub-decoder activating inverted signal RDENBBD is low, signal .oslashed. is high.

The other circuit of the block select circuit 7 is a voltage conversioncircuit made up of a NAND gate G3, an inverter I3, and HVNMOStransistors Qh4 to Qh19. When node N3 is high and in the block selectedstate and a signal RNGRD oscillates, the output N2 of the block selectcircuit will be at a voltage of V_(ppRW) +Vt (sub=V_(ppRW)). In thestand-by condition, all of the block select circuits 7 are in the blockselected state with signal RDENB at a high level and node N3 at a highlevel.

For the voltage conversion circuit to operate properly, it is desirablethat Vt (sub=V_(ppRW)) of HVNMOS transistor Qh should be lower than Vcc.Furthermore, it is desirable that HVNMOS transistor Qh should be in avery weak inversion state or a cut-off state with the substrate bias at0 V and the source and gate voltages at Vcc.

FIG. 6 shows a concrete structure of the main bit-line control circuit2, sub bit-line control circuit 3, and data latch/sense amplifiercircuit 4 of FIG. 1.

The main bit-line control circuit 2A is connected to the datalatch/sense amplifier circuit 4 when the signal SA at the gate electrodeof NMOS transistor Qn14 goes high. NMOS transistors Qn15 and Qn16, whena verify signal VRFYA goes high, charges the gate electrode of adepletion type n-channel MOS transistor Qd1 according to the data storedin the data latch/sense amplifier circuit 4. The channel in thedepletion type n-channel MOS transistor can be formed without anadditional manufacturing process, if it is formed at the same time thatthe channel of the depletion type select transistor in the memory cellarray is formed. In place of the depletion type n-channel MOStransistor, a MOS capacitor may be formed of an HVNMOS transistor Qh.

When signal SR goes high and signal SS1 or SS2 goes high, thisselectively connects bit line BL1 or BL2 in the memory cell array 1A tothe main bit-line control circuit 2. To achieve this, NMOS transistorsQn17, Qn19, Qn20 and HVNMOS transistors Qh28, Qh29 are provided. TheNMOS transistor Qn18 resets the bit line when signal RST is at a highlevel.

The main bit-line control circuit 2B has the same circuit configurationas that of the main bit-line control circuit 2A except that signal SB isset as control signal for signal SA and signal VRFYB is set as controlsignal for signal VRFYA according to the bit lines BL3, BL4 in the cellarray 1B.

The data latch/sense amplifier circuit 4 comprises a flip-flop FF madeup of NMOS transistors Qn11 to Qn13 and PMOS transistors Qp6 to QpS, anNMOS transistor Qn10 acting as an equalizer circuit, NMOS transistorsQn21, Qn22 acting as column select gates, and a NOR circuit G4 acting asa column address decoder.

When signal .o slashed.N is high and .o slashed.p is low, this willactivate the flip-flop FF; and when .o slashed.N is low and .o slashed.pis high, this will deactivate the flip-flop FF. When signal .o slashed.Egoes high, the two terminals of the flip-flop are equalized. The voltageVBITH is a power-supply voltage for the flip-flop. When all of thecolumn address inverted signals CADDBn (n=1, 2, 3) are low and columnaddress decoder activating inverted signal CENBB is low, the columnselect gate will turn ON and the flip-flop FF will be connected to thedata input/output lines IOA, IOB.

The sub bit-line control circuit 3A comprises a bit-line select gatecomposed of HVNMOS transistors Qh26, Qh27 and NMOS transistors Qn5, Qn6,an NMOS transistor Qn7 for bit-line resetting, an NMOS transistor Qn8for transferring a voltage of VA to a bit line, an NMOS transistor Qn9serving as a bit-line voltage sensing circuit, and fuses F2, F3 forrelieving defective bit lines.

The signals SS1 and SS2 selectively connect bit line BL1 or BL2 to thesub bit-line control circuit 3A. When signal RSTD is high, the bit linewill be reset. When signal PRE is high, the bit line charging voltage VAwill be transferred to the bit line. The output of the bit-line voltagesensing circuit is supplied as .o slashed.DTCA. Bit lines with leakdefects have the fuses F2, F3 cut off.

The sub bit-line control circuit 3B has the same circuit configurationas that of the sub bit-line control circuit 3A except that voltage VB isset for voltage VA and signal .o slashed.DTCB is set for signal .oslashed.DTCA according to the bit lines BL3, BL4 in the cell array 1B.

The operation of the memory cell array 1, main bit-line control circuit2, sub bit-line control circuit 3, data latch/sense amplifier circuit 4,word-line control circuit 6, and block select circuit 7 will bedescribed with reference to FIGS. 7 to 13. In the figures, the cellarray section indicates the memory cell array 1 section, the row decodersection indicates the sections of the word-line control circuit 6 andblock select circuit 7, the sense amplifier section indicates thesections of the main bit-line control circuit 2, sub bit-line controlcircuit 3, and data latch/sense amplifier circuit 4.

FIGS. 7 and 8 show the timing for a read operation in the case whereNAND cell unit NCU1 is selected, control gate CG2 is selected, and bitline BL1 is selected. In this case, bit line BL3 is a dummy bit line andbit lines BL2, BL4 are shielded lines.

First, when signal SS1 goes low, bit line BL1 is connected to the subbit-line control circuit 3A, bit line BL2 is connected to the mainbit-line control circuit 2A, bit line BL3 is connected to the subbit-line control circuit 3B, and bit line BL4 is connected to the mainbit-line control circuit 2B. Signal PRE goes high, allowing voltage VA(e.g., 1.2 V) and VB (e.g., 1.0 V) to charge the bit lines BL1, BL3,respectively. After the charging is complete, signal PRE goes low,following by signal SS2 going low, with the result that all of the bitlines are brought into the floating state. Signal RST goes low, and thensignal RSTD goes high and SS1 goes high, so that the select bit line BL1and dummy bit line BL3 are connected to the main bit-line controlcircuit 2 and the bit lines BL2, BL4 are connected to the sub bit-linecontrol circuit 3 and grounded.

Only the block select circuit 7 whose block address signals RAn, RBn,RCn (in FIGS. 7 and 8, generally called AddR) all go high when signalRDENBB goes low, produces the output N2 of a high level. When signalRDENBBD goes low and signal RNGRD oscillates, the output N2 of the blockselect circuit 7 is stepped up to Vcc+Vt (sub=Vcc). Signal LINK is alsostepped up to higher than Vcc+Vt (sub=Vcc).

When the signals VCG1, VCG3 to VCG16, VSGD2, VSGS2 go to Vcc, only theselected control gate CG2 goes to 0 V and the other control gates CG1,CG3 to CG16 go to Vcc. When the threshold voltage of memory cell M ishigher than 0 V, the voltage of bit line BL1 remains unchanged; when thethreshold voltage is lower than 0 V, the voltage of bit line BL1 dropsbelow the voltage of dummy bit line BL3. In a write verify operation,VCG2 goes to, for example, 0.5 V and CG2 goes to 0.5 as shown by dotedlines in FIGS. 7 and 8. It is when the threshold voltage of memory cellM is 0.5 V or less that the voltage of bit line BL1 drops below thevoltage of dummy bit line BL3.

After the signals VSGD2, VSGS2, VCG1 to VCG16 are all at 0 V, signalRNGRD stops oscillating, and signal RDENBBD goes high, followed byRDENBB going high, signal SR goes low, with the result that the voltageof select bit line BL1 is taken into the gate electrode of depletiontype n-channel MOS transistor Qd1 and the voltage of dummy bit line BL3is taken into the gate electrode of depletion type n-channel MOStransistor Qd2. Thereafter, only in a write verify operation, signalVRFYA goes high, making the voltage of the gate electrode of depletiontype n-channel MOS transistor Qd1 after "1" writing higher than thevoltage of the gate electrode of depletion type n-channel MOS transistorQd2.

Signals .o slashed.N, .o slashed.P go low and high, respectively,followed by signal .o slashed.E going high, with the result that thedata latch/sense amplifier circuit 4 is reset. Signals SA, SB go high,connecting the main bit-line control circuit 2 to the data latch/senseamplifier circuit 4, with the result that signal .o slashed.P goes lowand .o slashed.N goes high, allowing the voltage of the gate electrodesof the depletion type n-channel MOS transistors Qd1, Qd2 to be sensed.The sensed data is then latched. Signal SR goes high and the sensed datais transferred via bit line BL to the gate of NMOS transistor Qn9serving as the bit-line voltage sensing circuit.

When the writing has been finished in a write verify operation, all ofthe dummy bit lines BL3 are low, so that signal .o slashed.DCTBpreviously charged to a high level remains high. When the erasing hasbeen finished in an erase verify operation, all of the select bit linesBL1 are low, so that signal .o slashed.DCTA previously charged to a highlevel remains high.

In the present embodiment, sensing is effected by taking the voltage ofbit line BL into the gate electrodes of depletion type n-channel MOStransistors Qd1, Qd2. By controlling signal SR as shown by asingle-dot-dash line in FIGS. 7 and 8, bit line BL can be senseddirectly.

During a read operation, the voltage V_(ppRW) of the block selectcircuit 7 and the voltage VBITH of data latch/sense amplifier circuit 4are the power-supply voltage Vcc.

FIGS. 9 and 10 show the timing for a write operation in the case whereNAND cell unit NCU1 is selected, control gate CG2 is selected, and bitline BL1 is selected.

When signal RDENBB goes low, determining block address AddR, and signalRDENBBD goes low, allowing signal RNGRD to oscillate, the output N2 ofthe block select circuit becomes V_(ppRW) +Vt (sub=V_(ppRW)).

Signal SS2 goes low, connecting the selected bit line BL1 to the mainbit-line control circuit 2A and the unselected bit line BL2 to the subbit-line control circuit 3A. Signal RST goes low.

Signals VSGD2, VSGS1, VCG1 to VCG16, voltage Vsource, VA, signals PREand VRFYA go to the power-supply voltage Vcc. At this time, the selectedbit line BL1 is high in a "1" writing operation and low in a "0" writingoperation. When signal VRFYA goes low and signal SA goes high, bit lineBL1 is connected to data latch/sense amplifier circuit 4 via the mainbit-line control circuit 2A.

Then, voltage Vsource, VA, VBITH go to the output Vm8 (up to 8 V) of theVm8 charge pump circuit 14, signal LINK and voltage V_(ppRW) go to theoutput V_(ppW) (up to 18 V) of the Vpp charge pump circuit 12, andsignals SS1, PRE, SA, SR go to the output Vm10 (up to 10 V) of thecharge pump circuit 13.

Furthermore, signals VSGD2, VSGS1, VCG1, VCG3 to VCG16 go to Vm10. Thetiming with which these signals change may be the same as the timingthat voltage VBITH is stepped up to V_(m8). Then, signal VCG2 goes toV_(ppW) and the selected control gate CG2 goes to writing voltageV_(ppW). At this time, selected bit line BL1 is at Vm8 in a "1" writingoperation, and at 0 V in a "0" writing operation. The unselected bitline BL2 is at Vm8. Therefore, only in the memory cell M into which "0"is written, the voltage difference between the voltage V_(ppW) of thecontrol gate CG and the channel voltage of 0 V causes electron injectionin the charge storage layer, making the threshold voltage shift in thepositive direction.

In the embodiment, bit line BL1, unselected bit line BL2, and Vsourcevoltage are placed at Vm8 in a "1" write operation. The channel ofmemory cell M may be at about Vm8 through the capacitive couplingbetween the control gate CG and the channel of memory cell M by makinguse of the fact that the control gates CG1 to CG16 is raised from Vcc toVm10 or V_(ppW) with bit lines BL1, BL2, source line Vsource, and selectgates SGD2, SGS1 at Vcc. In this case, the signals take the forms asshown by dotted lines in FIGS. 9 and 10. The above scheme is called achannel floating scheme.

Signal VCG2 changes from V_(ppW) to Vcc and the selected control gateCG2 goes to Vcc. Then, signals VSGD2, VSGS1, VCG1, VCG3 to VCG16 changefrom Vm10 to Vcc, resetting the individual signals and voltages to thestand-by condition. During the write operation, signal .o slashed.N isVcc and .o slashed.p and .o slashed.E are at 0 V.

FIG. 11 shows the timing for the write stress test operation of thecircuits except for the memory cell array to which voltages Vm8, Vm10,and V_(ppW) are applied in the write operation.

The write stress test operation is basically the same as the writeoperation except that writing voltage V_(ppW) is not applied to anycontrol gates. Furthermore, control gates SGD1, SGD2, SGS1, SGS2 areselected at the same time, and signals SS1, SS2, voltages VA, VB arealso selected simultaneously. Both of signals SA and SB remain low,preventing voltage stress from being applied to the memory cell array. Astress test in a case where Vm10 is applied to signals SA, SB isconducted during an erasure stress test, which will be explained laterwith reference to FIG. 13.

Furthermore, block addresses AddR are generated so as to select all ofthe blocks. At this time, the blocks whose fuses F1 are cut off in theblock select circuit 7 are not selected. To select such blocks, signalsRDENBB and RDENBBD are set high.

In FIG. 11, the solid lines are related to a first write stress test,where Vm10 is applied to the select gates and control gates in thememory cell array and Vm8 is applied to the bit lines and source lines.In the case of the write operation in the channel floating schemeexplained using FIGS. 9 and 10, the results are shown by the dottedlines. The single-dot-dash lines in FIG. 11 indicate the results of asecond write stress test, where the select gates, control gates, bitlines, and source lines are all at 0 V. The data in the data latch/senseamplifier circuit 4 during the first write stress test is inverted inthe second write stress test.

FIG. 12 is the timing chart for an erase operation. First, all of thesignals VCG1 to VCG16 go to V_(ECG). The voltage V_(ECG) is such thatwhen V_(ECG) is applied to the source and drain of HVNMOS transistor Qhand the gate and substrate voltage are set at 0 V, HVNMOS transistor Qhis brought into the cut-off state. The voltage V_(ECG) is about 1 V. Theblock address signals RA, RB, RC are all high in the selected block (inFIG. 12, AddR is high) and any one of them is low in the unselectedblock (in FIG. 12, AddR is low).

The signals RDENBB, LINK, SS1, SS2 go low and the bit lines and thecontrol gates in the unselected block are brought into the floatingstate. The source lines Vsource are also brought into the floatingstate. Then, the signals VSGD1, SGD2, VSGS, VSGS2 are placed at Vcc andthe cell well C-p-well in which the memory cell array 1 is formed isplaced at Vcc. As a result, all of the bit lines BL, source linesVsource, all of the select gates SG, and the control gates CG of all ofthe unselected blocks are raised to about Vcc by the voltage of cellwell C-p-well. Only all of the control gates in the selected block areat V_(ECG).

Furthermore, when the cell well C-p-well has reached an erasing voltageV_(ppE) (up to 20 V), the output of the Vpp charge pump circuit 12, allof the bit lines, source lines Vsource, all of the select gates SG, andall of the control gates in all of the unselected blocks are raised toabout V_(ppE) by the voltage of cell well C-p-well. The voltagedifference between the voltage V_(ECG) of the control gates CG in theselected block and the voltage V_(ppE) of cell well C-p-well causeselectrons to be discharged from the charge storage layer in the memorycell M in the selected block, making the threshold voltage shift in thenegative direction.

After the cell well C-p-well changes from the erasing voltage V_(ppE) toVcc, the individual signals and voltages are reset to the stand-bycondition. In the erase operation, the voltage V_(ppRW) is at Vcc,signal RNGRD is at 0 V, and the individual signals and voltages in thesense amplifier section are at the same voltages as in the stand-bycondition except for the signals SS1 and SS2.

FIG. 13 shows the timing for an erasure stress test for the peripheralcircuits to which the erasing voltage is applied except for the memorycell array. The timing is basically the same as that for the eraseoperation except that no block is selected. Furthermore, the signalsVCG1 to VCG16 are supplied as Vpp output (V_(ppE) is outputted, althoughV_(ppW) in the write operation), which would not be effected in thewrite stress test, so that signal .o slashed.N goes low and .o slashed.pgoes high, deactivating the data latch/sense amplifier circuit 4,placing signals SA and SB at Vm10.

FIGS. 14A to 54 show the circuit configurations of the chief circuitsdealing with voltages Vm8, Vm10, and Vpp among the column controlcircuit 5, row control circuit 9, cell-well control circuit 10,cell-source control circuit 11, and charge pump circuits 12 to 14, andthe operations of these circuits.

FIG. 14A shows a concrete configuration of the Vpp switching circuit forswitching between the writing voltage/erasing voltage (Vpp) and theground. FIG. 14B shows a schematic symbol for the Vpp switching circuit.In FIG. 14A, HVNMOS transistors Qh34 to Qh36, Qh37 to Qh39, Qh40 toQh42, Qh43 to Qh45 have the same structure as that of the switchingcircuits shown in FIGS. 3C to 3E.

When signal PONB is high, output Vout is at 0 V. With signal PONB at alow level, when signal RNG oscillates, output Vout will rise to Vpp+Vt(sub=Vpp) higher than the writting voltage/erasing voltage (Vpp). FIG.15 shows the timing for the operation of this circuit. In the stand-bycondition, signal RNG is at 0 V, signal PONB is at Vcc, voltage Vpp isat Vcc, and Vout is at 0 V. When signal PONB is 0 V, Vout is at aboutVcc-Vt (sub=Vcc). With signal RNG oscillating, when voltage Vpp is Vqq,Vout is Vqq+Vt (sub=Vqq). When voltage Vpp is Vcc and signal PONB is atVcc, Vout is 0 V.

FIG. 16A shows a concrete configuration of the Vm switching circuit 17for switching between voltage Vm8 or Vm10 and the ground. FIG. 16B showsa schematic symbol for the Vm switching circuit. HVNMOS transistors Qh50to Qh52, Qh53 to Qh55 have the same structure as that of the switchingcircuits shown in FIGS. 3C to 3E. When signal PONB is high, output Voutis at 0 V. With signal PONB at a low level, when signal RNG oscillates,output Vout will rise to Vm+Vt (sub=Vm). FIG. 17 shows the timing forthe operation of this circuit. In the stand-by condition, signal RNG isat 0 V, signal PONB is at Vcc, and Vout is at 0 V. When signal PONB is 0V, Vout is at about Vcc-Vt (sub=Vcc). When signal RNG oscillates, Voutis Vm+Vt (sub=Vm). When signal PONB is Vcc, Vout is 0 V.

FIG. 18A shows a concrete configuration of the Vcc switching circuit 18for switching between the power-supply voltage and the ground. FIG. 18Bshows a schematic symbol for the Vcc switching circuit. When signal PONBis high, output Vout is at 0 V. With signal PONB at a low level, whensignal RNG oscillates, output Vout will rise to Vcc+2Vt (sub=Vcc). FIG.19 shows the timing for the operation of this circuit. In the stand-bycondition, signal RNG is at 0 V, signal PONB is at Vcc, and Vout is at 0V. When signal PONB is 0 V, Vout is at about Vcc-Vt (sub=Vcc). Whensignal RNG oscillates, Vout is Vcc+2Vt (sub=Vcc). When signal PONB isVcc, Vout is 0 V.

FIG. 20A shows a concrete configuration of the Vpp-Vcc switching circuit19 for switching between the writing voltage/erasing voltage and thepower-supply voltage Vcc. FIG. 20B shows a schematic symbol for theVpp-Vcc switching circuit. When signal EVCCB is low and signal EVPP islow, output Vout is at Vcc. With the signal EVCCB at a high level andthe signal EVPP at a high level, when signal RNG oscillates, output Voutis at Vpp. FIG. 21 shows the timing for this circuit. In the stand-bycondition, signal RNG is at 0 V, signals EVCCB and EVPP are at 0 V, andVout is at about Vcc in the floating state. When signal RNG oscillates,Vout becomes Vcc. When signal EVCCB goes to Vcc, followed by signal EVPPgoing to Vcc, then Vout goes to Vpp. When signal EVPP goes to 0 V,followed by signal EVCCB going to 0 V, then Vout goes to Vcc.

In this circuit, when the HVNMOS transistors Qh63, Qh64, Qh70, Qh71,Qh72, Qh78, Qh79 are made of the depletion type devices whose thresholdvoltage is lower, the stability is improved. In this case, it isdesirable that depletion type high-voltage-withstand n-channel MOStransistors should be such that they are in the inversion state with thegate voltage at Vcc, source voltage at 0 V, drain voltage at Vcc, andsubstrate voltage at 0 V, and that they are in the cut-off state withthe gate voltage at 0 V, source voltage at Vcc, drain voltage at Vcc,and substrate voltage at 0 V. When the depletion type is used, the inputsignal RNG to the NAND circuits G8, G9 is not needed and may be set to 0V. Furthermore, the depletion type high-voltage-withstand n-channel MOStransistors Qhd1, Qhd2 may be used to form a circuit of FIG. 20C. Thecircuit of FIG. 20C has a small number of transistors used, so that thecircuit area can be made smaller.

The HVNMOS transistors Qh4, Qh5, Qh6, Qh7 in the block select circuit 7of FIG. 5 may be replaced with the depletion type high-withstand voltagen-channel MOS transistors Qhd and signal RDENBBD may be supplied to thegates of Qh4 and Qh5. Furthermore, the HVNMOS transistors Qh30, Qh31,Qh32, Qh33, Qh46, Qh47, Qh48, Qh56, Qh57, Qh58 in FIGS. 14A, 14B, 16,and 18 may be replaced with the depletion type high-withstand voltagen-channel MOS transistors Qhd and signal PONB may be supplied to thegates of Qh30, Qh31, Qh46, Qh47, Qh56 and Qh57.

FIG. 22 shows a concrete configuration of the control gate driver thatoutputs signals VCGn (n=1 to 16). HVNMOS transistors Qh95 to Qh97, Qh98to Qh100 have the same structure as that of the switching circuits shownin FIGS. 3C to 3E. FIG. 23 shows the timing for this circuit. In thestand-by condition, signals RNG, CGVGL, CGVCC, CGVM, CGVPP, WPn are at 0V. WPn (n=1 to 16) corresponds to output VCGn (n=1 to 16), and WpnB isthe reverse of the WPn. In the stand-by condition, signals CGOV and CGTRare at Vcc, voltages VPPCG1 and VPPCG2 are at Vcc and voltage VGL is at0 V. Therefore, output VCGn is at 0 V.

In a read operation, signal CG0V is at 0 V and signals CGVGL and CGVCCare at Vcc. At this time, when WPn is at Vcc, voltage VGL is outputted.VGL is at 0 V in a read operation, at the verify voltage (up to 0.5 V)in a write verify operation, and at about 0 V to Vcc in a test operationof measuring the threshold voltage of a memory cell. When WPn is at 0 V,output VCGn is at Vcc.

In a write operation, signal CGOV is at 0 V, CGTR is at 0 V, and CGVCCis at Vcc, thereby outputting Vcc. Thereafter, signal CGVCC goes to 0 V,signals CGVPP and CGVM go to Vcc and voltages VPPCG1 and VPPCG2 go toV_(ppW). At this time, when signal WPn is at Vcc, V_(ppW) is outputted;when WPn is at 0 V, Vm10 is outputted. With voltage VPPCG2 returning toVcc, when WPn is at Vcc, output is Vcc. Thereafter, VPPCG1 returns toVcc. Then, signal CGVPP goes to 0 V and CGVM goes to 0 V. With signalCGVCC at Vcc again, when WPn is at 0 V, CGVM goes to 0 V. Signal CGVCCtoes to 0 V, CGOV and CGTR go to Vcc, causing the output to return to 0V.

In an erase operation, when signal CGOV is at 0 V, all of the WPn are atVcc, and signal CVGL is at Vcc, voltage VGL is outputted. Voltage VGL isat V_(ECG) (up to 1 V).

The HVNMOS transistor Qh94 may be replaced with the depletion typehigh-withstand voltage n-channel MOS transistor Qhd.

FIG. 24 shows a concrete configuration of the select gate driver thatoutputs signals VSGXn (X=D, S, n=1, 2). HVNMOS transistors Qh105 toQh107 have the same structure as that of the switching circuits shown inFIGS. 3C to 3E. FIG. 25 shows the timing for this circuit. In thestand-by condition, signals RNG, SGGND, SGVCC, SGVM, WSXn are at 0 V.Signal WSXn (X=D, S, n=1, 2) corresponds to output VSGXn (X=D, S, n=1,2), and WSXnB is the reverse of the WSXnB. Signal SG0V is at Vcc.

In a read operation, with signal SG0V at 0 V and signals SGGND, SGVCC atVcc, when signal WSXn is at Vcc, Vcc is outputted; and when WSXn is at 0V, output is at 0 V. In a write operation, when signal SG0V goes to 0 Vand signal WSXn is at 0 V, signal SGGND going to Vcc outputs 0 V. Withsignal WSXn at Vcc, when SGVCC is at Vcc, Vcc is outputted; and whensignal SGVM is at Vcc, Vm10 is outputted. In an erase operation, all ofthe signal WSXn are at Vcc and all of the VSGZn are at Vcc.

FIG. 26 shows a circuit that controls voltage VPPCGn (n=1, 2). SignalsCDVPPn (n=1, 2) and CDVCCnB (n=1, 2) correspond to output VPPCGn (n=1,2). When signals CDVPPn and CDVCCnB are at 0 V, Vcc is outputted; andwhen signals CDVPPn and CDVCCnB are at Vcc and signal RNG oscillates,Vpp is outputted.

FIG. 27 shows a circuit that controls voltage V_(ppRW). When signalsRWVPP and RWVCCB are at 0 V, Vcc is outputted; and when signals RWVPPand RWVCCB are at Vcc and signal RNG oscillates, Vpp is outputted.

FIG. 28 shows a concrete configuration of a circuit that outputs signalLINK. FIG. 29 shows the timing for the operation of this circuit. In thestand-by condition, when signals RNG, LK0V, LKBT, and LKVCCB are at 0 V,signals LKTR and LKVPPB are at Vcc and voltages VPPLK1 and VPPLK2 are atVcc. Therefore, the output is at Vcc.

In a read operation, when signal LKTR goes to 0 V, signal LKVCCB goes toVcc, and signal LKBT goes to Vcc, then the output LINK is raised fromVcc to Vcc+α. α is lower than Vcc. In a write operation, when signalLKTR goes to 0 V, LKVCCB goes to Vcc, LKVPPB goes to 0 V, and voltagesVPPLK1 and VPPLK2 go to V_(ppW), the output LINK goes to V_(ppW). Whenvoltage VPPLK2 goes to Vcc, the output LINK goes to Vcc. In an eraseoperation, when signals LKVCCB and LK0V go to Vcc, the output LINK goesto 0 V.

The HVNMOS transistors Qh108 and Qh109 may be replaced with thedepletion type high-withstand voltage n-channel MOS transistor Qhd.

FIG. 30 shows a circuit that controls voltage VPPLKn (n=1, 2). SignalsLKVPPn (n=1, 2) and LKVCCnB (n=1, 2) correspond to output VPPLKn (n=1,2). When signals LKVPPn and LKVCCnB are at 0 V, Vcc is outputted; andwhen signals LKVPPn and LKVCCnB are at Vcc and signal RNG oscillates,Vpp is outputted.

FIG. 31 shows a circuit that controls voltage VPPCPWn (n=1, 2). SignalsCPVPPn (n=1, 2) and CPVCCnB (n=1, 2) correspond to output VPPCPWn (n=1,2). When signals CPVPPn and CPVCCnB are at 0 V, Vcc is outputted; andwhen signals CPVPPn and CPVCCnB are at Vcc and signal RNG oscillates,Vpp is outputted.

FIG. 32 shows a concrete configuration of a circuit that outputs voltageC-p-well. HVNMOS transistors Qh115 to Qh117 have the same structure asthat of the switching circuits shown in FIGS. 3C to 3E. FIG. 33 showsthe timing for the operation of this circuit. In the stand-by operation,when signals RNGE, READ, MVGD are at 0 V, signals CPW0V, CPW3VB, CPWTR,CPWVPPB are at Vcc and voltages VPPCPW1, VPPCPW2 are at Vcc. Therefore,the output is at 0 V.

In a read operation, although the output C-p-well is at 0 V, when signalMVTD goes to Vcc, voltage VPW is outputted. Voltage VPW ranges from 0 Vto Vcc and is used in a test operation of measuring the negativethreshold voltage of memory cell M. In an erase operation, when signalsCPW0V, CPW3VB, CPWTR, CPWVPPB go to 0 V and voltages VPPCPW1, VPPCPW2 goto VppE, V_(ppE) is outputted. When voltage VPPCPW2 goes to Vcc,C-p-well goes to Vcc, signals CPW0V, CPW3VB, CPWTR, CPWVPPB go to Vcc,the output goes to 0 V.

The HVNMOS transistor Qh114 may be replaced with the depletion typehigh-withstand voltage n-channel MOS transistor Qhd.

FIG. 34 shows a concrete configuration of a circuit that outputs voltageVsource. HVNMOS transistors Qh120 to Qh122 have the same structure asthat of the switching circuits shown in FIGS. 3C to 3E. FIG. 35 showsthe timing for the operation of this circuit. In the stand-by operation,when signals RNGE, READ, MVTD are at 0 V, signals CS0V, CSTR, CS3VB,CSVCCB, and CSVM8B are at Vcc. Therefore, the output is at 0 V.

In a read operation, although output Vsource is at 0 V, when signal MVTDis at Vcc, voltage VPW is outputted. The voltage VPW ranges from 0 V toVcc and is used in a test operation of measuring the negative thresholdvoltage of memory cell M. In a write operation, when signal CS0V goes to0 V and CS3VB and CSVCCB goes to 0 V, Vcc is outputted. Thereafter, whensignal CSVCCB goes to Vcc, CSTR and CSVM8B go to 0 V, Vm8 is outputted.In an erase operation, when signals CS0V, CS3VB, and CSTR go to 0 V, theoutput Vsource is brought into the floating state. At this time, thevoltage changes according to the voltage C-p-well.

The HVNMOS transistor Qh118 may be replaced with the depletion typehigh-withstand voltage n-channel MOS transistor Qhd.

FIG. 36 shows a concrete configuration of a circuit that outputs signalSX (X=A, B). HVNMOS transistors Qh127 to Qh129 have the same structureas that of the switching circuits shown in FIGS. 3C to 3E. FIG. 37 showsthe timing for the operation of this circuit. In the stand-by operation,when signals RNG, SABTRB, SAB3V, SABBT, SAB10V, CELLX are at 0 V, signalSABOV is at Vcc. Therefore, the output is at 0 V. Signal CELLX (X =A, B)corresponds to output SX (X=A, B).

In a read operation, when signal SAB0V goes to 0 V, SAB3V goes to Vcc,and both of CELLA and CELLB go to Vcc, and then signals SABTRB and SABBTgo to Vcc, the output becomes Vcc+α. α is lower than Vcc. In a writeoperation, when signal SAB0V goes to 0 V and signal SAB3V goes to Vcc,and then signal SABTRB goes to Vcc, SAB10V goes to Vcc. In this case,when signal CELLX is at Vcc, the output is at about Vm10+Vcc-Vt(sub=Vm10).

The HVNMOS transistors Qh123, Qh124 may be replaced with the depletiontype high-withstand voltage n-channel MOS transistors Qhd.

FIG. 38 shows a concrete configuration of a circuit that outputs signalSSn (n=1, 2). FIG. 39 shows the timing for the operation of thiscircuit. In the stand-by operation, when signals RNG, SSRSTB, SSGND,SSBT, SSVCC, SS10V, SBLn are at 0 V. Therefore, the output is at Vcc.Signal SBLn (X=1, 2) corresponds to output SSn (X=1, 2). The signalSBLnB is the reverse of signal SBLn.

In a read operation, signal SSRSTB goes to Vcc, SSGND goes to Vcc, andSSBT goes to Vcc. In this situation, when signal SBLn is at Vcc, theoutput is raised to Vcc+α. α is lower than Vcc. When signal SBLn is at 0V, the output is 0 V. In a write operation, signals SSRSTB and SSGND goto Vcc and signal SS10V goes to Vcc. In this situation, when signal SBLnis at Vcc, the output is at about Vm10+Vcc-Vt (sub=Vm10). When signalSBLn is at 0 V, 0 V is outputted. In an erase operation, when signalsSSRSTB and SSGND go to Vcc and both of SBL1 and SBL2 go to 0 V, both ofoutputs SS1 and SS2 go to 0 V.

FIG. 40 shows a concrete configuration of a circuit that controlsvoltage VBITH. FIG. 41 shows the timing for the operation of thiscircuit. In the stand-by operation, when signals RNG, NWSV are at 0 Vand signal NW8VDB is at Vcc. Therefore, the output is at Vcc. Whensignal NWSV is at Vcc and NWSVDB is at 0 V, voltage VBITH is at V_(m8).

The HVNMOS transistor Qh138 may be replaced with the depletion typehigh-withstand-voltage n-channel MOS transistor Qhd.

FIG. 42 shows a concrete configuration of a circuit that outputs voltageVX (X=A, B). HVNMOS transistors Qh144 to Qh146 have the same structureas that of the switching circuits shown in FIGS. 3C to 3E. FIG. 43 showsthe timing for the operation of this circuit. In the stand-by operation,when signals RNG, VABRSTB, VAB0V, VABL, VABH, VAB8V, PRCX are at 0 V,and both voltages of VHL and VHH are at 0 V. Therefore, the output is at0 V. Signal PRCX (X=A, B) corresponds to output VX (X=A, B). SignalPRCXB is the reverse of PRCX.

In a read operation, with signal VABRSTB at Vcc, and both of VABL andVABH at Vcc, when PRCX is at Vcc, voltage VHH is outputted; and whensignal PRCX is at 0 V, voltage VHL is outputted. In a write operation,signal VABRSTB is at Vcc. With signal PRCX at 0 V, when signal VAB0V isat Vcc, the output is at 0 V. With signal PRCX at Vcc, when signal VABHand voltage VHH go to Vcc, the output goes to Vcc; and when signal VAB8Vgoes to Vcc, the output goes to Vm8.

FIG. 44 shows a concrete configuration of a circuit that outputs signalPRE. HVNMOS transistors Qh151 to Qh153 have the same structure as thatof the switching circuits shown in FIGS. 3C to 3E. FIG. 45 shows thetiming for the operation of this circuit. In the stand-by operation,when signals RNG, PREBT, and PRE10V are at 0 V, and signals PR0V andPRTR are at Vcc. Therefore, the output is at 0 V.

In a read operation, with signal PR0V at 0 V and PRTR at 0 V, whensignal PRBT is at Vcc, the output is at Vcc+α. α is lower than Vcc. In awrite operation, when signal PR0V goes to 0 V, signal PRTR goes to 0 Vand then signal PR10V goes to Vcc, the output becomes about Vm10+Vcc-Vt(sub=Vm10).

The HVNMOS transistors Qh147, Qh148 may be replaced with the depletiontype high-withstand voltage n-channel MOS transistors Qhd.

FIG. 46 shows a concrete configuration of a circuit that outputs signalSR. FIG. 47 shows the timing for the operation of this circuit. In thestand-by operation, when signals RNG, SR0V, SRBT, SRVCCB are at 0 V,signal SR10VB is at Vcc. Therefore, the output is at Vcc.

In a read operation, when signal SRVCCB goes to Vcc and signal SRBT goesto Vcc, the output becomes Vcc+α. α is lower than Vcc. Then, when SR0Vgoes to Vcc, the output becomes 0 V. In a write operation, when signalSRVCCB goes to Vcc, and then signal SR10VB goes to 0 V, the outputbecomes about Vm10+Vcc-Vt (sub=Vm10).

FIG. 48 shows a concrete configuration of a circuit that outputs signal.o slashed.E. FIG. 49 shows the timing for the operation of thiscircuit. In the stand-by operation, signals FIETRB, FIEBT are at 0 V andsignal FIE3VB is at Vcc. Therefore, the output is at Vcc.

In a read operation, when signal FIE3VB goes to 0 V and signal FIETRBgoes to Vcc, and then signal FIEBT goes to Vcc, the output becomesVcc+α. α is lower than Vcc. The HVNMOS transistors Qh162, Qh163 may bereplaced with the depletion type high-withstand voltage n-channel MOStransistors Qhd.

FIG. 50 shows a concrete configuration of a circuit that outputs signalVRFYX (X=A, B). FIG. 51 shows the timing for the operation of thiscircuit. In the stand-by operation, signals VR3V, VRTRB, VRBT, PRCX areat 0 V. Therefore, the output is at Vcc. Signal PRCX (X=A, B)corresponds to output VRFYX (X=A, B). Signal PRCXB is the reverse ofPRCX.

In a read operation, when signal VR3V goes to Vcc and signal VRTRB goesto Vcc, then signal VRBT goes Vcc. In this situation, when signal PRCXis at Vcc, the output becomes Vcc+α. α is lower than Vcc. When signalPRXC is at 0 V, the output is at 0 V.

The HVNMOS transistors Qh164, Qh165 may be replaced with the depletiontype high-withstand voltage n-channel MOS transistors Qhd.

FIG. 52A concretely shows a charge pump cell used in the charge pumpcircuit. When signal PRST rises sufficiently, the charge pump cell isreset. With signal PRST at 0 V and signal .o slashed. at 0 V, whensignal .o slashed.B goes to Vcc, the input voltage Vin is transferred toVout. Thereafter, signal .o slashed. becomes Vcc, stepping up thevoltage Vout. FIG. 52B shows a schematic symbol for the charge pump cell20.

The HVNMOS transistors Qh166, Qh169, Qh170, Qh172 may be replaced withthe depletion type high-withstand voltage n-channel MOS transistors Qhd.

FIG. 53 shows a concrete configuration of the charge pump circuit. A Vppcharge pump circuit 12, a Vm10 charge pump circuit 13, and a Vm8 chargepump circuit 14 are the same as that of FIG. 3E except for the number ofcharge pump cells 20. A charge pump circuit with a low stepped-upvoltage requires a smaller number of charge pump cells. In FIG. 53, theoutput is VPUMP. The Vpp charge pump circuit 12, Vm10 charge pumpcircuit 13, and Vm8 charge pump circuit 14 output Vpp, Vm10, and Vm8,respectively. When signal PRSTB is at Vcc, the charge pump circuit isreset. When signal PRSTB goes to 0 V and signals .o slashed.1 to .oslashed.4 oscillate, the output VPUMP is stepped up.

The HVNMOS transistors Qh173, Qh174, Qh176, Qh178 may be replaced withthe depletion type high-withstand-voltage n-channel MOS transistors Qhd.In this case, the gates of Qh174, Qh176 are supplied with signal PRSTB.

FIG. 54 shows a concrete configuration of the stepped-up voltage limitercircuit. The stepped-up voltage limiters connected to a Vpp charge pumpcircuit 12, a Vm10 charge pump circuit 13, and a Vm8 charge pump circuit14 are the same as that of FIG. 3E except for the way of connecting aswitch. In FIG. 54, the output is VPUMP. The Vpp charge pump circuit 12,Vm10 charge pump circuit 13, and Vm8 charge pump circuit 14 output Vpp,Vm10, and Vm8, respectively. When signal PRSTB is at Vcc, the outputVPUMP is at Vcc.

Signal EXV is normally at 0 V. When Vpp, Vm10, and Vm8 are suppliedexternally in a test operation, EXV is at Vcc. When signal PRSTB goes to0 V, resistors R1 to Rn between voltage VPUMP and the ground supply avoltage proportional to VPUMP to a voltage comparator 21 via the switchSW. The voltage is compared with a reference voltage Vref. If Vref ishigher, the voltage comparator applies a low voltage to the gateelectrode of NMOS transistor Qn35. If vref is lower, the voltagecomparator applies a high voltage to the gate electrode of NMOStransistor Qn35 to lower VPUMP. With the limiter circuit, by changingthe connection of switch SW after manufacturing, voltage trimming can beeffected according to variations in production. FIG. 55 shows the timingfor the stepping-up operation. As an example, the way of stepping up theoutput Vpp of the Vpp charge pump circuit is shown in FIG. 56 inconnection with FIG. 55.

The HVNMOS transistor Qh181 may be replaced with the depletion typehigh-withstand voltage n-channel MOS transistor Qhd. In this case, thegate of Qh181 is supplied with signal PRSTB.

FIG. 57 shows a concrete configuration of a circuit that controlsvoltage Vdd. In the stand-by condition, when signal CESB is at Vcc,voltage Vdd is disconnected from the power-supply voltage Vcc. When itis not in the stand-by condition, signal CESB is at 0 V and Vdd is atVcc.

FIG. 58 shows the distribution of threshold voltages of memory cells Mafter the data is written into such a NAND EEPROM. The distribution wasobtained by writing "0" into all of memory cells M with the same writingvoltage and the same writing time. Since actual writing is effected byalternating a write operation with a bit-by-bit verify operation, thethreshold voltage distribution width of memory cells M becomes narrower.To cause the threshold voltages to fall in a specific distribution rangewithin a specific writing time, however, the distribution as shown inFIG. 58 must fall in the specific range. To achieve this, cells (remotebits) whose threshold voltage is remote from the specific range must bereplaced with redundant cells. Furthermore, when the writing voltagedeviates from the setting, trimming must be done. Then, the thresholdvoltage range having the distribution rate larger than a suitabledistribution rate K is measured. Its lower limit is determined to beVt-min and its upper limit is determined to be Vt-max.

FIGS. 59A and 59B show the method of trimming the writing voltageV_(ppW) using Vt-min and Vt-max and the method of sensing remote bits.

First, more than a specific number of memory cells, for example, all ofthe memory cells, are erased (step P1). The writing voltage V_(ppW) isplaced at an initial value of V_(ppW0) (step P2), thereby writing thedata into the erased memory cells during a fixed writing time T_(pW)(step P3). After the writing, the threshold voltage distribution of thewritten memory cells is measured to find Vth-min and Vth-max (step P4).

When Vt-min is lower than 0 V, the writing voltage is too low. WhenVt-max exceeds the power-supply voltage Vcc, the writing voltage is toohigh. Therefore, it is desirable that when too low, the writing voltageV_(ppW) should be raised by ΔVpp and when too high, it should be loweredby ΔVpp. The reason for this is that they exceed the threshold voltagerange in which the threshold voltage can be measured accurately. All ofthe bits are erased and measured again. Here, when V_(ppW) has exceededthe upper limit V_(ppW-max) or dropped below the lower limitV_(ppW-min), the measurement is stopped and the product is treated asdefective (steps P5, P6, P17 to P21).

Vt-center is determined to be (Vt-max+Vt-min)/2 (step P7).

When Vt-center is higher than V2, the writing voltage is too high. WhenVt-center is lower than V1, the writing voltage is too low. Therefore,it is desirable that when too low, the writing voltage V_(ppW) should beraised by ΔVpp and when too high, it should be lowered by ΔVpp. Thereason for this is that they exceed the threshold voltage range in whichthe threshold voltage can be measured accurately. All of the bits areerased and measured again. Here, when V_(ppW) has exceeded the upperlimit V_(ppW-max) or dropped below the lower limit V_(ppW-min), themeasurement is stopped and the product is treated as defective (stepsPS, P9, P22 to P26).

Taking into account the difference between the initial value V_(ppW0) ofthe writing voltage and the writing voltage V_(ppW) used in measurement,Vt-center is corrected to be Vt1. For example, it is assumed thatVt-center is corrected by V_(ppW0) -V_(ppW) to be Vt1 (step P10). Then,the deviation ΔVt of Vt1 from the optimum value Vt0 is determined (stepP11). If ΔVt is not a value that allows trimming, the measurement isstopped and the product is treated as defective (step P12).

Writing voltage trimming is effected on the basis of ΔVt (step P13).Memory cells whose threshold voltage exceeds a specific range withVt-center in the center are determined to be remote bits (step P14).When remote bits cannot be relieved, the product is treated as defective(step P15). Finally, the remote bits are relieved (step P16) and theprocess is completed.

The trimming of the writing voltage V_(ppW) is effected by shifting, forexample, ΔVt. Specifically, immediately after the manufacture, ifV_(ppW) is 20 V and ΔVt is 1 V, trimming is done so the V_(ppW) may bethe closest to 21 V. The same holds true for erasing voltage trimmingand remote bits after erasure on the basis of the threshold voltagedistribution after erasure.

FIG. 60 is an another block diagram of a NAND-cell EEPROM according toan embodiment of the present invention. The NAND-cell EEPROM of FIG. 60characterized by further comprising a test mode signal generatingcircuit 23. With the above, configuration, the test mode signalgenerating circuit 23 performs an erasure operation without selectingany memory cell and at the same time, deactivates the data storagecircuit includes in the test mode signal generating circuit 23 (notshown).

FIG. 61 a still another block diagram of a NAND-cell EEPROM according toan embodiment of the present invention. The NAND-cell EEPROM of FIG. 61characterized by further comprising a programming voltage controlcircuit 24 and a reading voltage control circuit 25. With thisconfiguration, the programming voltage control circuit 24 adjusts aprogramming voltage, and the reading voltage control circuit 25 appliesa positive voltage to the gate of memory cell and 0 V to the source ofNAND-cell in the read operation after the programming operation, and 0 Vto the gate of memory cell and the positive voltage to the source ofNAND-cell in the read operation after the erasure operation.

FIG. 62 a still another block diagram of a NAND-cell EEPROM according toan embodiment of the present invention. The NAND-cell EEPROM of FIG. 62characterized by further comprising a reading voltage control circuit 25and a erasing voltage control circuit 26. With this configuration, thereading voltage control circuit 25 applies a positive voltage to thegate of memory cell and 0 V to the source of NAND-cell in the readoperation after the programming operation, and 0 V to the gate of memorycell and the positive voltage to the source of NAND-cell in the readoperation after the erasure operation, and the erasing voltage controlcircuit 26 adjusts an erasing voltage.

As described above, with the present invention, thehigh-withstand-voltage transistors to which the writing voltage or theerasing voltage is applied are made up of such transistors as are in theinverted or weak inversion state when its threshold voltage is low, andits gate voltage, source voltage, and substrate voltage are at 0 V.Furthermore, it has been explained that the high-withstand-voltagetransistors may be restricted to only one type. While in theembodiments, the high-withstand-voltage transistors have been explainedusing n-channel MOS transistors as an example, the same holds true forp-channel MOS transistors.

Furthermore, with the present invention, not only writing voltagetrimming but also the sensing of the memory cells with remote thresholdvoltages forming the foot of the threshold voltage distribution can beeffected on the basis of the threshold voltage range with a specificdistribution rate in the threshold voltage distribution of the memorycells after a write operation without a verify operation. While in theembodiments, these operations are performed on the basis of thethreshold voltage after writing, NOR EEPROMs enable the same operationson the basis of the threshold voltage after erasing.

A nonvolatile semiconductor memory device of the present invention canbe applied to not only the NAND-cell EEPROM as described above, but alsothe NOR-cell EEPROM. Furthermore, it can be partially applied to varioustypes of semiconductor memory devices such as DRAMs, SRAMs, or MROMs.

Furthermore, the present invention has a variety of applications to theeffect of being explained above. For example, in the switching circuitsshown in FIGS. 3B and 3E, the HVNMOS transistor Qh3 may be replaced witha depletion type n-channel MOS transistor with its gate voltage fixed at0 V. In this case, it is desirable that the depletion type n-channel MOStransistor should be in the cut-off state with its substrate bias andgate voltage at 0 V and its source voltage at 0 V. Furthermore, when avoltage to be transferred to the source with the substrate bias and gatevoltage at 0 V and the drain voltage at Vcc, is applied to the source,it is desirable that the HVNMOS transistor Qh should be in the cut-offstate.

Additional advantages and modifications will readily occur to thoseskilled in the art. Therefore, the present invention in its broaderaspects is not limited to the specific details, representative devices,and illustrated examples shown and described herein. Accordingly,various modifications may be made without departing from the spirit orscope of the general inventive concept as defined by the appended claimsand their equivalents.

What is claimed is:
 1. A semiconductor memory device comprising:an arrayof electrically rewritable memory cells which are arranged in a matrix;erasing means for applying an erasing voltage to said memory cells toeffect erasing; and writing means for applying a writing voltage to saidmemory cells to effect writing; said erasing means and writing meanscomprising a high-voltage switching circuit for outputting a highvoltage applied to an input terminal to an output terminal in a selectedmode and electrically disconnecting said input terminal from said outputterminal in the unselected mode, said high-voltage switching circuitcomprising,a first NMOS transistor having a gate, a source, and a draincoupled to said input terminal, a second NMOS transistor having a gate,a source coupled to said output terminal, and a drain coupled to thesource of said first NMOS transistor, and a third NMOS transistor havinga gate, a source coupled to the source of said first NMOS transistor,and a drain to which a predetermined first voltage is applied at leastin the unselected mode, wherein the gates of said first and second NMOStransistors are coupled to an ON voltage to transfer said high voltageapplied via said input terminal to said drain of said first NMOStransistor to said source of said second NMOS transistor in the selectedmode, and are grounded in the unselected mode, and the gate of saidthird NMOS transistor is grounded in the selected mode and is coupled toa predetermined second voltage in the unselected mode.
 2. Asemiconductor memory device according to claim 1, wherein each of saidmemory cells is composed of a charge storage layer and a control gatelaminated together on a semiconductor layer and composed of a source anda drain at a surface of said semiconductor substrate.
 3. A semiconductormemory device according to claim 2, further comprising an well regionprovided on the surface of said substrate so as to include said sourceand drain of said memory cell.
 4. A semiconductor memory deviceaccording to claim 3, wherein said erasing voltage is applied to saidwell region and a low erasing voltage is applied to said control gate ofsaid memory cell.
 5. A semiconductor memory device according to claim 3,wherein said writing voltage applied to said control gate of said memorycell and a specific voltage based on data is applied to bit lineconnected to said memory cell.
 6. A semiconductor memory deviceaccording to claim 1, wherein said first and second MOS transistors arein a weak inversion state or an inversion state with their substratebias voltage, gate voltage and source voltage at 0 V.
 7. A semiconductormemory device comprising;an array of electrically rewritable memorycells which are arranged in a matrix; erasing means for applying anerasing voltage to said memory cells to effect erasing; and writingmeans for applying a writing voltage to said memory cells to effectwriting; said erasing means and writing means comprising a high-voltageswitching circuit for outputting a high voltage applied to an inputterminal to an output terminal in a selected mode and electricallydisconnecting said input terminal from said output terminal in theunselected mode, said high-voltage switching circuit comprising,a firstMOS transistor having a gate, a source, and a drain coupled to saidinput terminal, a second MOS transistor having a gate, a source coupledto said output terminal, and a drain coupled to the source of said firstMOS transistor, and a third MOS transistor having a gate, a sourcecoupled to the source of said first MOS transistor, and a drain to whicha predetermined first voltage is applied at least in the unselectedmode, wherein said first, second and third MOS transistors are of thesame conductivity type, the gates of said first and second MOStransistors are coupled to an ON voltage to transfer said high voltageapplied via said input terminal to said drain of said first MOStransistor to said source of said second MOS transistor in the selectedmode, and are grounded in the unselected mode, and the gate of saidthird MOS transistor is grounded in the selected mode and is coupled toa predetermined second voltage in the unselected mode.
 8. Asemiconductor memory device according to claim 7, wherein each of saidmemory cells is composed or a charge storage layer and a control gatelaminated together on a semiconductor layer and composed of a source anda drain at a surface of said semiconductor substrate.
 9. A semiconductormemory device according to claim 7, wherein said first MOS transistorand is an n-channel MOS transistor and is in a cut-off state under thecondition at a voltage transferred to the source of said third MOStransistor with the substrate bias voltage at 0 V and the gate voltageat a predetermined second voltage and the drain voltage at saidpredetermined first voltage is applied to the source with the substratebias voltage and gate voltage at 0 V.
 10. A semiconductor memory deviceaccording to claim 7, wherein said first and second MOS transistors aren-channel MOS transistors and are in an inversion state under theconditions that the substrate bias voltage is at 0 V and the sourcevoltage is said erasing voltage and writing voltage and that the gatevoltage is said erasing voltage and said writing voltage added with apower-supply voltage.
 11. A semiconductor memory device according toclaim 7, wherein said first and second MOS transistors are n-channel MOStransistors and are in a cut-off state under the conditions that avoltage transferred to the source of said third MOS transistor with thesubstrate bias voltage at 0 V and the gate voltage at a predeterminedsecond voltage and the drain voltage at said predetermined first voltageis applied to the source with the substrate bias voltage and gatevoltage at 0 V, and are in an inversion state under the conditions thatthe substrate bias voltage is at 0 V and the source voltage is saiderasing voltage and writing voltage and that the gate voltage is saiderasing voltage and said writing voltage added with a power-supplyvoltage.
 12. A semiconductor memory device according to claim 7, whereinsaid first and second MOS transistors are in a weak inversion state oran inversion state with their substrate bias voltage, gate voltage andsource voltage at 0 V.
 13. A semiconductor memory device comprising:anarray of electrically rewritable memory cells which are arranged in amatrix; erasing means for applying an erasing voltage to said memorycells to effect erasing; and writing means for applying a writingvoltage to said memory cells to effect writing; said erasing means andwriting means comprising a high-voltage switching circuit for outputtinga high voltage applied to an input terminal to an output terminal in aselected mode and electrically disconnecting said input terminal fromsaid output terminal in the unselected mode, said high-voltage switchingcircuit comprising,a first MOS transistor having a gate, a source, and adrain coupled to said input terminal, a second MOS transistor having agate, a source coupled to said output terminal, and a drain coupled tothe source of said first MOS transistor, and a third MOS transistorhaving a gate, a source coupled to the source of said first MOStransistor, and a drain to which a predetermined first voltage isapplied at least in the unselected mode, wherein said first, second andthird MOS transistors are of the same conductivity type, the gates ofsaid first and second MOS transistors are coupled to an ON voltage totransfer said high voltage applied via said input terminal to said drainof said first MOS transistor to said source of said second MOStransistor in the selected mode, and are grounded in the unselectedmode, and the gate of said third MOS transistor is grounded in theselected mode and is coupled to a predetermined second voltage in theunselected mode said first, second and third MOS transistors composed oftwo types of MOS transistors, a first type and a second type, thesecond-type MOS transistor being an n-channel MOS transistor that is inan inversion state with the substrate bias voltage at 0 V and the gateand source voltages at a predetermined third voltage and in a cut-offstate with the substrate bias voltage and gate voltage at 0 V and thesource voltage at a predetermined fourth voltage, and the first-type MOStransistor being an n-channel MOS transistor that is in a weak inversionstate or an inversion state with the substrate bias voltage, gatevoltage, and source voltage at 0 V and having a threshold voltage higherthan that of said second-type n-channel MOS transistor.
 14. Asemiconductor memory device according to claim 13, wherein each of saidmemory cells is composed of a charge storage layer and a control gatelaminated together on a semiconductor layer and composed of a source anda drain at a surface of said semiconductor substrate.
 15. Asemiconductor memory device according to claim 13, wherein said firstMOS transistor is an n-channel MOS transistor and is in a cut-off stateunder the condition at a voltage transferred to the source of said thirdMOS transistor with the substrate bias voltage at 0 V and the gatevoltages at a predetermined second voltage and the drain voltage at saidpredetermined first voltage is applied to the source with the substratebias voltage and gate voltage at 0 V.
 16. A semiconductor memory deviceaccording to claim 13, wherein said first-type n-channel MOS transistorsare in an inversion state under the conditions that the substrate biasvoltage is at 0 V and the source voltage is said erasing voltage andwriting voltage and that the gate voltage is said erasing voltage andsaid writing voltage added with a power-supply voltage.
 17. Asemiconductor memory device according to claim 13, wherein saidfirst-type n-channel MOS transistors are in a cut-off state under theconditions that a voltage transferred to the source of said third MOStransistor with the substrate bias voltage at 0 V and the gate voltageat a predetermined second voltage and the drain voltage at saidpredetermined first voltage is applied to the source with the substratebias voltage and gate voltage at 0 V, and are in an inversion stateunder the conditions that the substrate bias voltage is at 0 V and thesource voltage is said erasing voltage and writing voltage and that thegate voltage is said erasing voltage and said writing voltage added witha power-supply voltage.
 18. A semiconductor memory device comprising:anarray of electrically rewritable memory cells which are arranged in amatrix; erasing means for applying an erasing voltage to said memorycells to effect erasing; and writing means for applying a writingvoltage to said memory cells to effect writing; said erasing means andwriting means comprising one of MOS transistors to which a voltagehigher than said erasing voltage and writing voltage is applied and MOStransistors which transfer a voltage higher than said erasing voltageand writing voltage and containing MOS transistors which are in a weakinversion state or an inversion state with their substrate bias voltage,gate voltage and source voltage 0 V.
 19. A semiconductor memory deviceaccording to claim 18, wherein said erasing means and writing meanscomprise a high voltage switching circuit for outputting a high voltageapplied to an input terminal to an output terminal in a selected modeand electrically disconnecting said input terminal from said outputterminal in the unselected mode, said high-voltage switching circuitcomprising,a first NMOS transistor having a gate, a source, and a draincoupled to said input terminal, a second NMOS transistor having a gate,a source coupled to said output terminal, and a drain coupled to thesource of said first NMOS transistor, and a third NMOS transistor havinga gate, a source coupled to the source of said first NMOS transistor,and a drain to which a predetermined first voltage is applied at leastin the unselected mode, wherein the gates of said first and second NMOStransistors are coupled to an ON voltage to transfer said high voltageapplied via said input terminal to said drain of said first NMOStransistor to said source of said second NMOS transistor in the selectedmode, and are grounded in the unselected mode, and the gate of saidthird NMOS transistor is grounded in the selected mode and is coupled toa predetermined second voltage in the unselected mode.
 20. Asemiconductor memory device comprising:an array of electricallyrewritable memory cells which are arranged in a matrix; erasing meansfor applying an erasing voltage to said memory cells to effect erasing;and writing means for applying a writing voltage to said memory cells toeffect writing; and said erasing means and writing means comprisingeither MOS transistors to which a voltage higher than said erasingvoltage and writing voltage is applied or MOS transistors which transfera voltage higher than said erasing voltage and writing voltage composedonly of MOS transistors of a first type, said MOS transistors being in aweak inversion state or an inversion state with their substrate biasvoltage, gate voltage and source voltage at 0 V.
 21. A semiconductormemory device according to claim 20, wherein:said erasing means andwriting means comprise a high-voltage switching circuit for outputting ahigh voltage applied to an input terminal to an output terminal in aselected mode and electrically disconnecting said input terminal fromsaid output terminal in the unselected mode, said high-voltage switchingcircuit comprising,a first MOS transistor having a gate, a source, and adrain coupled to said input terminal, a second MOS transistor having agate, a source coupled to said output terminal, and a drain coupled tothe source of said first MOS transistor, and a third MOS transistorhaving a gate, a source coupled to the source of said first MOStransistor, and a drain to which a predetermined first voltage isapplied at least in the unselected mode, wherein said first, second andthird MOS transistors are of the same conductivity type, the gates ofsaid first and second MOS transistors are coupled to an ON voltage totransfer said high voltage applied via said input terminal to said drainof said first MOS transistor to said source of said second MOStransistor in the selected mode, and are grounded in the unselectedmode, and the gate of said third MOS transistor is grounded in theselected mode and is coupled to a predetermined second voltage in theunselected mode.
 22. A semiconductor memory device comprising:an arrayof electrically rewritable memory cells which are arranged in a matrix;erasing means for applying an erasing voltage to said memory cells toeffect erasing; and writing means for applying a writing voltage to saidmemory cells to effect writing; and said erasing means and writing meanscomprising either MOS transistors to which a voltage higher than saiderasing voltage and writing voltage is applied or MOS transistors whichtransfer a voltage higher than said erasing voltage and writing voltagebeing composed of two types of MOS transistors, a first type and asecond type, the second-type MOS transistor being an n-channel MOStransistor that is in an inversion state with the substrate bias voltageat 0 V and the gate and source voltages at a power-supply voltage and ina cut-off state with the substrate bias voltage and gate voltage at 0 Vand the source voltage at the power-supply voltage, and the first-typeMOS transistor being an n-channel MOS transistor that is in a weakinversion state or an inversion state with the substrate bias voltage,gate voltage, and source voltage at 0 V and having a threshold voltagehigher than that of said second-type n-channel MOS transistor.
 23. Asemiconductor memory device according to claim 22, whereinsaid erasingmeans and writing means comprise a high-voltage switching circuit foroutputting a high voltage applied to an input terminal to an outputterminal in a selected mode and electrically disconnecting said inputterminal from said output terminal in the unselected mode, saidhigh-voltage switching circuit comprising,a first MOS transistor havinga gate, a source, and a drain coupled to said input terminal, a secondMOS transistor having a gate, a source coupled to said output terminal,and a drain coupled to the source of said first MOS transistor, and athird MOS transistor having a gate, a source coupled to the source ofsaid first MOS transistor, and a drain to which a predetermined firstvoltage is applied at least in the unselected mode, wherein said first,second and third MOS transistors are of the same conductivity type, thegates of said first and second MOS transistors are coupled to an ONvoltage to transfer said high voltage applied via said input terminal tosaid drain of said first MOS transistor to said source of said secondMOS transistor in the selected mode, and are grounded in the unselectedmode, and the gate of said third MOS transistor is grounded in theselected mode and is coupled to a predetermined second voltage in theunselected mode said first, second and third MOS transistors composed oftwo types of MOS transistors, a first type and a second type, thesecond-type MOS transistor being an n-channel MOS transistor that is inan inversion state with the substrate bias voltage at 0 V and the gateand source voltages at a predetermined third voltage and in a cut-offstate with the substrate bias voltage and gate voltage at 0 V and thesource voltage at a predetermined fourth voltage, and the first-type MOStransistor being an n-channel MOS transistor that is in a weak inversionstate or an inversion state with the substrate bias voltage, gatevoltage, and source voltage at 0 V and having a threshold voltage higherthan that of said second-type n-channel MOS transistor.